Semiconductor structure
A semiconductor structure includes a semiconductor fin protruding from a substrate, a dielectric fin disposed adjacent to and substantially parallel to the semiconductor fin, an epitaxial source/drain (S/D) feature disposed in the semiconductor fin, a dielectric layer disposed between a sidewall of...
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creator | LIU CHANGMIAO LIU GECHENG ZHENG MINGLONG |
description | A semiconductor structure includes a semiconductor fin protruding from a substrate, a dielectric fin disposed adjacent to and substantially parallel to the semiconductor fin, an epitaxial source/drain (S/D) feature disposed in the semiconductor fin, a dielectric layer disposed between a sidewall of the epitaxial S/D feature and a sidewall of the dielectric fin, and an air gap disposed in the dielectric layer.
一种半导体结构,包含从基板突出的半导体鳍片、与半导体鳍片相邻且大致上平行设置的介电鳍片、设置于半导体鳍片中的外延源极/漏极(S/D)部件、设置于外延S/D部件的侧壁与介电鳍片的侧壁之间的介电层、以及设置于介电层中的气隙。 |
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一种半导体结构,包含从基板突出的半导体鳍片、与半导体鳍片相邻且大致上平行设置的介电鳍片、设置于半导体鳍片中的外延源极/漏极(S/D)部件、设置于外延S/D部件的侧壁与介电鳍片的侧壁之间的介电层、以及设置于介电层中的气隙。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220819&DB=EPODOC&CC=CN&NR=114927473A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220819&DB=EPODOC&CC=CN&NR=114927473A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU CHANGMIAO</creatorcontrib><creatorcontrib>LIU GECHENG</creatorcontrib><creatorcontrib>ZHENG MINGLONG</creatorcontrib><title>Semiconductor structure</title><description>A semiconductor structure includes a semiconductor fin protruding from a substrate, a dielectric fin disposed adjacent to and substantially parallel to the semiconductor fin, an epitaxial source/drain (S/D) feature disposed in the semiconductor fin, a dielectric layer disposed between a sidewall of the epitaxial S/D feature and a sidewall of the dielectric fin, and an air gap disposed in the dielectric layer.
一种半导体结构,包含从基板突出的半导体鳍片、与半导体鳍片相邻且大致上平行设置的介电鳍片、设置于半导体鳍片中的外延源极/漏极(S/D)部件、设置于外延S/D部件的侧壁与介电鳍片的侧壁之间的介电层、以及设置于介电层中的气隙。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAPTs3NTM7PSylNLskvUiguKQIySotSeRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvLOfoaGJpZG5ibmxozExagAA3CJ6</recordid><startdate>20220819</startdate><enddate>20220819</enddate><creator>LIU CHANGMIAO</creator><creator>LIU GECHENG</creator><creator>ZHENG MINGLONG</creator><scope>EVB</scope></search><sort><creationdate>20220819</creationdate><title>Semiconductor structure</title><author>LIU CHANGMIAO ; LIU GECHENG ; ZHENG MINGLONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN114927473A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>LIU CHANGMIAO</creatorcontrib><creatorcontrib>LIU GECHENG</creatorcontrib><creatorcontrib>ZHENG MINGLONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIU CHANGMIAO</au><au>LIU GECHENG</au><au>ZHENG MINGLONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor structure</title><date>2022-08-19</date><risdate>2022</risdate><abstract>A semiconductor structure includes a semiconductor fin protruding from a substrate, a dielectric fin disposed adjacent to and substantially parallel to the semiconductor fin, an epitaxial source/drain (S/D) feature disposed in the semiconductor fin, a dielectric layer disposed between a sidewall of the epitaxial S/D feature and a sidewall of the dielectric fin, and an air gap disposed in the dielectric layer.
一种半导体结构,包含从基板突出的半导体鳍片、与半导体鳍片相邻且大致上平行设置的介电鳍片、设置于半导体鳍片中的外延源极/漏极(S/D)部件、设置于外延S/D部件的侧壁与介电鳍片的侧壁之间的介电层、以及设置于介电层中的气隙。</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | Semiconductor structure |
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