Crystal triode automatic etching device for current amplification
The invention relates to the technical field of crystal triode production, in particular to a crystal triode automatic etching device for current amplification, which is favorable for enabling a triode printed circuit board to be in full contact with etching liquid and improving the etching rate. Co...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of crystal triode production, in particular to a crystal triode automatic etching device for current amplification, which is favorable for enabling a triode printed circuit board to be in full contact with etching liquid and improving the etching rate. Comprising an etching box and a mounting plate, two guide rail modules are symmetrically arranged on the inner wall of the etching box, two first convex columns are arranged on the two sides of the mounting plate, and the mounting plate is mounted between the two guide rail modules in a horizontal sliding mode all the time through the first convex columns; the mounting plate is symmetrically provided with two groups of plate placing mechanisms, the plate placing mechanisms are used for fixing a plurality of groups of triode printed circuit boards, the etching box is also provided with a driving mechanism, and the driving mechanism is used for driving the mounting plate to move along the guide rail module.
本发明涉及晶体三极管生 |
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