Large-view-field high-numerical-aperture projection photoetching objective lens

The invention provides a large-view-field high-numerical-aperture projection photoetching objective lens, which comprises a first lens group, a second lens group, a third lens group and a fourth lens group, a second lens group having a negative refractive power; the third lens group has positive foc...

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Bibliographische Detailangaben
Hauptverfasser:	ZHU XIANCHANG, KANG XIA, ZHOU JI, LU YUTONG, LIU WENJING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides a large-view-field high-numerical-aperture projection photoetching objective lens, which comprises a first lens group, a second lens group, a third lens group and a fourth lens group, a second lens group having a negative refractive power; the third lens group has positive focal power; a fourth lens group having a negative refractive power; a fifth lens group having a positive refractive power; the sixth lens group has positive focal power; the sum of the focal power of the first lens group, the second lens group, the third lens group, the fourth lens group, the fifth lens group and the sixth lens group is 0; the large-view-field high-numerical-aperture projection photoetching objective lens comprises five aspherical lenses, and each aspherical lens comprises an aspherical surface and a spherical surface. The maximum image space numerical aperture of the large-view-field high-numerical-aperture projection photoetching objective lens is 0.82. The invention provides a large-view-field hig