Substrate processing apparatus

The present invention relates to a substrate processing apparatus, comprising: a chamber providing a processing space; a cover member covering an upper portion of the chamber; a substrate supporting unit that supports at least one substrate and is rotatable about a rotation axis so that the substrate passes through the imaging region; a gas injection unit configured to inject a process gas toward the substrate supporting unit; a region photographing unit that photographs an image of the imaging region to obtain a thermal image of the imaging region; and a calculation unit that calculates temperature data of the substrate from the thermal image. 本发明关于一种基板处理设备，包含：腔室，提供处理空间；盖件，覆盖腔室的上部；基板支撑单元，支撑着至少一个基板且可绕旋转轴旋转，以使基板穿过成像区域；气体喷射单元，用于将处理气体喷向基板支撑单元；区域摄影单元，拍摄成像区域的图像以获得成像区域的热图像；以及计算单元，自热图像计算基板的温度数据。