Illumination system, lithography machine and illumination uniformity compensation method

The invention provides an illumination system, a photoetching machine and an illumination uniformity compensation method. The illumination unit is used for providing first illumination. The light uniformizing unit is used for uniformizing the first illumination and converting the first illumination...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TIAN YIQIANG, CHU ZHAOXIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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