Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix

Provided is a pigment dispersion composition for a black matrix, from which a black matrix having excellent adhesion to a substrate can be formed. The pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and at least one amine co...

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creator HAITO TETSU
TSUJI YASUHITO
description Provided is a pigment dispersion composition for a black matrix, from which a black matrix having excellent adhesion to a substrate can be formed. The pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and at least one amine compound selected from the following compounds (A)-(D): (A) an amine compound having a pyridine skeleton; (B) an amine compound having an aniline skeleton; (C) an amine compound having a carbazole skeleton; and (D) an amine compound having a linear alkyl group having 8 or more carbon atoms and having a total number of 20 or less carbon atoms. 本发明提供一种黑矩阵用颜料分散组合物,由其能够形成相对于基板的密合性优异的黑矩阵。该黑矩阵用颜料分散组合物包含黑色着色剂、酞菁铜的磺化物和胺化合物,所述胺化合物是选自下列化合物(A)~(D)中的至少一种:(A)具有吡啶骨架的胺化合物;(B)具有苯胺骨架的胺化合物;(C)具有咔唑骨架的胺化合物;(D)具有碳原子数为8以上的直链烷基、碳原子总数为20以下的胺化合物。
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN114539849A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN114539849A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN114539849A3</originalsourceid><addsrcrecordid>eNrjZEgLyEzPTc0rUUjJLC5ILSrOzM9TSM7PLcgvziwBsdPyixSSchKTsxVyE0uKMit0FIpSizOLSwgoSsxLQRHhYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhiamxpYWJpaOxsSoAQCwHj_q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><source>esp@cenet</source><creator>HAITO TETSU ; TSUJI YASUHITO</creator><creatorcontrib>HAITO TETSU ; TSUJI YASUHITO</creatorcontrib><description>Provided is a pigment dispersion composition for a black matrix, from which a black matrix having excellent adhesion to a substrate can be formed. The pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and at least one amine compound selected from the following compounds (A)-(D): (A) an amine compound having a pyridine skeleton; (B) an amine compound having an aniline skeleton; (C) an amine compound having a carbazole skeleton; and (D) an amine compound having a linear alkyl group having 8 or more carbon atoms and having a total number of 20 or less carbon atoms. 本发明提供一种黑矩阵用颜料分散组合物,由其能够形成相对于基板的密合性优异的黑矩阵。该黑矩阵用颜料分散组合物包含黑色着色剂、酞菁铜的磺化物和胺化合物,所述胺化合物是选自下列化合物(A)~(D)中的至少一种:(A)具有吡啶骨架的胺化合物;(B)具有苯胺骨架的胺化合物;(C)具有咔唑骨架的胺化合物;(D)具有碳原子数为8以上的直链烷基、碳原子总数为20以下的胺化合物。</description><language>chi ; eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220527&amp;DB=EPODOC&amp;CC=CN&amp;NR=114539849A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220527&amp;DB=EPODOC&amp;CC=CN&amp;NR=114539849A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAITO TETSU</creatorcontrib><creatorcontrib>TSUJI YASUHITO</creatorcontrib><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><description>Provided is a pigment dispersion composition for a black matrix, from which a black matrix having excellent adhesion to a substrate can be formed. The pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and at least one amine compound selected from the following compounds (A)-(D): (A) an amine compound having a pyridine skeleton; (B) an amine compound having an aniline skeleton; (C) an amine compound having a carbazole skeleton; and (D) an amine compound having a linear alkyl group having 8 or more carbon atoms and having a total number of 20 or less carbon atoms. 本发明提供一种黑矩阵用颜料分散组合物,由其能够形成相对于基板的密合性优异的黑矩阵。该黑矩阵用颜料分散组合物包含黑色着色剂、酞菁铜的磺化物和胺化合物,所述胺化合物是选自下列化合物(A)~(D)中的至少一种:(A)具有吡啶骨架的胺化合物;(B)具有苯胺骨架的胺化合物;(C)具有咔唑骨架的胺化合物;(D)具有碳原子数为8以上的直链烷基、碳原子总数为20以下的胺化合物。</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgLyEzPTc0rUUjJLC5ILSrOzM9TSM7PLcgvziwBsdPyixSSchKTsxVyE0uKMit0FIpSizOLSwgoSsxLQRHhYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhiamxpYWJpaOxsSoAQCwHj_q</recordid><startdate>20220527</startdate><enddate>20220527</enddate><creator>HAITO TETSU</creator><creator>TSUJI YASUHITO</creator><scope>EVB</scope></search><sort><creationdate>20220527</creationdate><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><author>HAITO TETSU ; TSUJI YASUHITO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN114539849A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>HAITO TETSU</creatorcontrib><creatorcontrib>TSUJI YASUHITO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAITO TETSU</au><au>TSUJI YASUHITO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><date>2022-05-27</date><risdate>2022</risdate><abstract>Provided is a pigment dispersion composition for a black matrix, from which a black matrix having excellent adhesion to a substrate can be formed. The pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and at least one amine compound selected from the following compounds (A)-(D): (A) an amine compound having a pyridine skeleton; (B) an amine compound having an aniline skeleton; (C) an amine compound having a carbazole skeleton; and (D) an amine compound having a linear alkyl group having 8 or more carbon atoms and having a total number of 20 or less carbon atoms. 本发明提供一种黑矩阵用颜料分散组合物,由其能够形成相对于基板的密合性优异的黑矩阵。该黑矩阵用颜料分散组合物包含黑色着色剂、酞菁铜的磺化物和胺化合物,所述胺化合物是选自下列化合物(A)~(D)中的至少一种:(A)具有吡啶骨架的胺化合物;(B)具有苯胺骨架的胺化合物;(C)具有咔唑骨架的胺化合物;(D)具有碳原子数为8以上的直链烷基、碳原子总数为20以下的胺化合物。</abstract><oa>free_for_read</oa></addata></record>
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subjects ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
title Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T05%3A11%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HAITO%20TETSU&rft.date=2022-05-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN114539849A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true