Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix
Provided is a pigment dispersion composition for black matrices, from which a black matrix in which the surface resistance value does not decrease even after post-baking at a high temperature for a long period of time can be formed, and a resist composition for black matrices in which the breakpoint...
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| creator | HAITO TETSU TSUJI YASUHITO |
| description | Provided is a pigment dispersion composition for black matrices, from which a black matrix in which the surface resistance value does not decrease even after post-baking at a high temperature for a long period of time can be formed, and a resist composition for black matrices in which the breakpoint does not vary with the storage time can be obtained. A pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and an epoxy compound.
本发明提供一种黑矩阵用颜料分散组合物，由其能够形成即使进行高温且长时间的后烘烤也不降低表面电阻值的黑矩阵，并且能够得到断点不随保存时间而变化的黑矩阵用抗蚀剂组合物。一种黑矩阵用颜料分散组合物，其包含黑色着色剂、酞菁铜的磺化物和环氧化合物。 |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN114539847A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN114539847A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN114539847A3</originalsourceid><addsrcrecordid>eNrjZEgLyEzPTc0rUUjJLC5ILSrOzM9TSM7PLcgvziwBsdPyixSSchKTsxVyE0uKMit0FIpSizOLSwgoSsxLQRHhYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhiamxpYWJuaOxsSoAQCvyj_m</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><source>esp@cenet</source><creator>HAITO TETSU ; TSUJI YASUHITO</creator><creatorcontrib>HAITO TETSU ; TSUJI YASUHITO</creatorcontrib><description>Provided is a pigment dispersion composition for black matrices, from which a black matrix in which the surface resistance value does not decrease even after post-baking at a high temperature for a long period of time can be formed, and a resist composition for black matrices in which the breakpoint does not vary with the storage time can be obtained. A pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and an epoxy compound.
本发明提供一种黑矩阵用颜料分散组合物，由其能够形成即使进行高温且长时间的后烘烤也不降低表面电阻值的黑矩阵，并且能够得到断点不随保存时间而变化的黑矩阵用抗蚀剂组合物。一种黑矩阵用颜料分散组合物，其包含黑色着色剂、酞菁铜的磺化物和环氧化合物。</description><language>chi ; eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220527&DB=EPODOC&CC=CN&NR=114539847A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220527&DB=EPODOC&CC=CN&NR=114539847A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAITO TETSU</creatorcontrib><creatorcontrib>TSUJI YASUHITO</creatorcontrib><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><description>Provided is a pigment dispersion composition for black matrices, from which a black matrix in which the surface resistance value does not decrease even after post-baking at a high temperature for a long period of time can be formed, and a resist composition for black matrices in which the breakpoint does not vary with the storage time can be obtained. A pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and an epoxy compound.
本发明提供一种黑矩阵用颜料分散组合物，由其能够形成即使进行高温且长时间的后烘烤也不降低表面电阻值的黑矩阵，并且能够得到断点不随保存时间而变化的黑矩阵用抗蚀剂组合物。一种黑矩阵用颜料分散组合物，其包含黑色着色剂、酞菁铜的磺化物和环氧化合物。</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgLyEzPTc0rUUjJLC5ILSrOzM9TSM7PLcgvziwBsdPyixSSchKTsxVyE0uKMit0FIpSizOLSwgoSsxLQRHhYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhiamxpYWJuaOxsSoAQCvyj_m</recordid><startdate>20220527</startdate><enddate>20220527</enddate><creator>HAITO TETSU</creator><creator>TSUJI YASUHITO</creator><scope>EVB</scope></search><sort><creationdate>20220527</creationdate><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><author>HAITO TETSU ; TSUJI YASUHITO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN114539847A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>HAITO TETSU</creatorcontrib><creatorcontrib>TSUJI YASUHITO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAITO TETSU</au><au>TSUJI YASUHITO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix</title><date>2022-05-27</date><risdate>2022</risdate><abstract>Provided is a pigment dispersion composition for black matrices, from which a black matrix in which the surface resistance value does not decrease even after post-baking at a high temperature for a long period of time can be formed, and a resist composition for black matrices in which the breakpoint does not vary with the storage time can be obtained. A pigment dispersion composition for a black matrix includes a black colorant, a sulfonated product of copper phthalocyanine, and an epoxy compound.
本发明提供一种黑矩阵用颜料分散组合物，由其能够形成即使进行高温且长时间的后烘烤也不降低表面电阻值的黑矩阵，并且能够得到断点不随保存时间而变化的黑矩阵用抗蚀剂组合物。一种黑矩阵用颜料分散组合物，其包含黑色着色剂、酞菁铜的磺化物和环氧化合物。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES USE OF MATERIALS THEREFOR WOODSTAINS |
| title | Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix |
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