High-efficiency low-damage defect surface ion beam polishing equipment and polishing method

The invention belongs to the technical field of ion beam machining, and particularly relates to high-efficiency low-damage defect surface ion beam polishing equipment and method. The equipment comprises an ion beam polishing equipment chamber and an ion source system, wherein a workpiece is mounted...

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Hauptverfasser: NIE JUNWEI, YANG FAZHAN, ZHENG CAIGUO, LIU KEWEI, CHEN QINGCHUAN
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creator NIE JUNWEI
YANG FAZHAN
ZHENG CAIGUO
LIU KEWEI
CHEN QINGCHUAN
description The invention belongs to the technical field of ion beam machining, and particularly relates to high-efficiency low-damage defect surface ion beam polishing equipment and method. The equipment comprises an ion beam polishing equipment chamber and an ion source system, wherein a workpiece is mounted in the ion beam polishing equipment chamber; the ion source system is connected with the radio frequency power supply, the bias power supply and the lead-out power supply; according to the method, after fused quartz is selected as a workpiece to be fixed, the normal direction of the machined surface of the workpiece is parallel to the incident direction of an ion beam, an equipment cavity is closed and vacuumized, working gas is introduced, the working gas is excited and ionized, high-density plasma is generated, and meanwhile a bias power supply and extraction voltage are started; and bombarding the surface of the workpiece by using a multi-component ion beam formed by alternately led-out positive and negative ion
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN114346767A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN114346767A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN114346767A3</originalsourceid><addsrcrecordid>eNqNjL0KwjAURrM4iPoO1wfIUFraWYrSycnNocTkS3shf5oU8e11cHB0OnA4nLW4DjzNEtayZgT9Ihef0iivJpCBhS6Ul4dVGsQx0A3KU4qO88xhItwXTh6hkArmx3uUOZqtWFnlMnZfbsT-dLz0g0SKI3L6TAPK2J-rqqmbtmu7Q_1P8wZinzuF</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>High-efficiency low-damage defect surface ion beam polishing equipment and polishing method</title><source>esp@cenet</source><creator>NIE JUNWEI ; YANG FAZHAN ; ZHENG CAIGUO ; LIU KEWEI ; CHEN QINGCHUAN</creator><creatorcontrib>NIE JUNWEI ; YANG FAZHAN ; ZHENG CAIGUO ; LIU KEWEI ; CHEN QINGCHUAN</creatorcontrib><description>The invention belongs to the technical field of ion beam machining, and particularly relates to high-efficiency low-damage defect surface ion beam polishing equipment and method. The equipment comprises an ion beam polishing equipment chamber and an ion source system, wherein a workpiece is mounted in the ion beam polishing equipment chamber; the ion source system is connected with the radio frequency power supply, the bias power supply and the lead-out power supply; according to the method, after fused quartz is selected as a workpiece to be fixed, the normal direction of the machined surface of the workpiece is parallel to the incident direction of an ion beam, an equipment cavity is closed and vacuumized, working gas is introduced, the working gas is excited and ionized, high-density plasma is generated, and meanwhile a bias power supply and extraction voltage are started; and bombarding the surface of the workpiece by using a multi-component ion beam formed by alternately led-out positive and negative ion</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220415&amp;DB=EPODOC&amp;CC=CN&amp;NR=114346767A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220415&amp;DB=EPODOC&amp;CC=CN&amp;NR=114346767A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NIE JUNWEI</creatorcontrib><creatorcontrib>YANG FAZHAN</creatorcontrib><creatorcontrib>ZHENG CAIGUO</creatorcontrib><creatorcontrib>LIU KEWEI</creatorcontrib><creatorcontrib>CHEN QINGCHUAN</creatorcontrib><title>High-efficiency low-damage defect surface ion beam polishing equipment and polishing method</title><description>The invention belongs to the technical field of ion beam machining, and particularly relates to high-efficiency low-damage defect surface ion beam polishing equipment and method. The equipment comprises an ion beam polishing equipment chamber and an ion source system, wherein a workpiece is mounted in the ion beam polishing equipment chamber; the ion source system is connected with the radio frequency power supply, the bias power supply and the lead-out power supply; according to the method, after fused quartz is selected as a workpiece to be fixed, the normal direction of the machined surface of the workpiece is parallel to the incident direction of an ion beam, an equipment cavity is closed and vacuumized, working gas is introduced, the working gas is excited and ionized, high-density plasma is generated, and meanwhile a bias power supply and extraction voltage are started; and bombarding the surface of the workpiece by using a multi-component ion beam formed by alternately led-out positive and negative ion</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjL0KwjAURrM4iPoO1wfIUFraWYrSycnNocTkS3shf5oU8e11cHB0OnA4nLW4DjzNEtayZgT9Ihef0iivJpCBhS6Ul4dVGsQx0A3KU4qO88xhItwXTh6hkArmx3uUOZqtWFnlMnZfbsT-dLz0g0SKI3L6TAPK2J-rqqmbtmu7Q_1P8wZinzuF</recordid><startdate>20220415</startdate><enddate>20220415</enddate><creator>NIE JUNWEI</creator><creator>YANG FAZHAN</creator><creator>ZHENG CAIGUO</creator><creator>LIU KEWEI</creator><creator>CHEN QINGCHUAN</creator><scope>EVB</scope></search><sort><creationdate>20220415</creationdate><title>High-efficiency low-damage defect surface ion beam polishing equipment and polishing method</title><author>NIE JUNWEI ; YANG FAZHAN ; ZHENG CAIGUO ; LIU KEWEI ; CHEN QINGCHUAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN114346767A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NIE JUNWEI</creatorcontrib><creatorcontrib>YANG FAZHAN</creatorcontrib><creatorcontrib>ZHENG CAIGUO</creatorcontrib><creatorcontrib>LIU KEWEI</creatorcontrib><creatorcontrib>CHEN QINGCHUAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NIE JUNWEI</au><au>YANG FAZHAN</au><au>ZHENG CAIGUO</au><au>LIU KEWEI</au><au>CHEN QINGCHUAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>High-efficiency low-damage defect surface ion beam polishing equipment and polishing method</title><date>2022-04-15</date><risdate>2022</risdate><abstract>The invention belongs to the technical field of ion beam machining, and particularly relates to high-efficiency low-damage defect surface ion beam polishing equipment and method. The equipment comprises an ion beam polishing equipment chamber and an ion source system, wherein a workpiece is mounted in the ion beam polishing equipment chamber; the ion source system is connected with the radio frequency power supply, the bias power supply and the lead-out power supply; according to the method, after fused quartz is selected as a workpiece to be fixed, the normal direction of the machined surface of the workpiece is parallel to the incident direction of an ion beam, an equipment cavity is closed and vacuumized, working gas is introduced, the working gas is excited and ionized, high-density plasma is generated, and meanwhile a bias power supply and extraction voltage are started; and bombarding the surface of the workpiece by using a multi-component ion beam formed by alternately led-out positive and negative ion</abstract><oa>free_for_read</oa></addata></record>
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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
DRESSING OR CONDITIONING OF ABRADING SURFACES
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
title High-efficiency low-damage defect surface ion beam polishing equipment and polishing method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T18%3A56%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NIE%20JUNWEI&rft.date=2022-04-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN114346767A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true