Air inlet element for CVD reactor

The invention relates to a venting surface (16) for a gas inlet element (2) of a CVD reactor (1) or for a cover plate (14) of a gas inlet element (2), comprising a plurality of venting openings (7, 17) arranged around a center (10), the midpoints (8 ') of the venting openings (7, 17) lying on t...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SCHON OLIVER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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