Air inlet element for CVD reactor
The invention relates to a venting surface (16) for a gas inlet element (2) of a CVD reactor (1) or for a cover plate (14) of a gas inlet element (2), comprising a plurality of venting openings (7, 17) arranged around a center (10), the midpoints (8 ') of the venting openings (7, 17) lying on t...
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| creator | SCHON OLIVER |
| description | The invention relates to a venting surface (16) for a gas inlet element (2) of a CVD reactor (1) or for a cover plate (14) of a gas inlet element (2), comprising a plurality of venting openings (7, 17) arranged around a center (10), the midpoints (8 ') of the venting openings (7, 17) lying on the angular points (8') of a polygonal, identically designed unit (8) having a geometric center point (9), according to the invention, the edges (8 ") of the cells (8) are defined by intersecting reference lines (13, 13 ', 13"), the reference lines (13, 13', 13 ") are associated with at least two line groups, and the reference lines of the line groups each run straightly and parallel to one another over the entire exhaust surface. According to the invention, the center (10) is spaced from the corner (8 ') by a distance of 1/3 +/-10% of the length of the edge.
本发明涉及一种用于CVD反应器(1)的进气元件(2)或者用于进气元件(2)的遮护板(14)的排气面(16)，所述排气面具有多个围绕中心(10)布置的排气开口(7、17)，其中，所述排气开口(7、17)的中点(8′)位于呈多边形的、相同地设计并且具有几何中心点(9)的单元(8)的角点(8′)上，其中，所述单元(8)的边缘(8") |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN114269968A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN114269968A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN114269968A3</originalsourceid><addsrcrecordid>eNrjZFB0zCxSyMzLSS1RSM1JzU3NK1FIyy9ScA5zUShKTUwuyS_iYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhiZGZpaWZhaOxsSoAQAzgCT6</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Air inlet element for CVD reactor</title><source>esp@cenet</source><creator>SCHON OLIVER</creator><creatorcontrib>SCHON OLIVER</creatorcontrib><description>The invention relates to a venting surface (16) for a gas inlet element (2) of a CVD reactor (1) or for a cover plate (14) of a gas inlet element (2), comprising a plurality of venting openings (7, 17) arranged around a center (10), the midpoints (8 ') of the venting openings (7, 17) lying on the angular points (8') of a polygonal, identically designed unit (8) having a geometric center point (9), according to the invention, the edges (8 ") of the cells (8) are defined by intersecting reference lines (13, 13 ', 13"), the reference lines (13, 13', 13 ") are associated with at least two line groups, and the reference lines of the line groups each run straightly and parallel to one another over the entire exhaust surface. According to the invention, the center (10) is spaced from the corner (8 ') by a distance of 1/3 +/-10% of the length of the edge.
本发明涉及一种用于CVD反应器(1)的进气元件(2)或者用于进气元件(2)的遮护板(14)的排气面(16)，所述排气面具有多个围绕中心(10)布置的排气开口(7、17)，其中，所述排气开口(7、17)的中点(8′)位于呈多边形的、相同地设计并且具有几何中心点(9)的单元(8)的角点(8′)上，其中，所述单元(8)的边缘(8")</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220401&DB=EPODOC&CC=CN&NR=114269968A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220401&DB=EPODOC&CC=CN&NR=114269968A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHON OLIVER</creatorcontrib><title>Air inlet element for CVD reactor</title><description>The invention relates to a venting surface (16) for a gas inlet element (2) of a CVD reactor (1) or for a cover plate (14) of a gas inlet element (2), comprising a plurality of venting openings (7, 17) arranged around a center (10), the midpoints (8 ') of the venting openings (7, 17) lying on the angular points (8') of a polygonal, identically designed unit (8) having a geometric center point (9), according to the invention, the edges (8 ") of the cells (8) are defined by intersecting reference lines (13, 13 ', 13"), the reference lines (13, 13', 13 ") are associated with at least two line groups, and the reference lines of the line groups each run straightly and parallel to one another over the entire exhaust surface. According to the invention, the center (10) is spaced from the corner (8 ') by a distance of 1/3 +/-10% of the length of the edge.
本发明涉及一种用于CVD反应器(1)的进气元件(2)或者用于进气元件(2)的遮护板(14)的排气面(16)，所述排气面具有多个围绕中心(10)布置的排气开口(7、17)，其中，所述排气开口(7、17)的中点(8′)位于呈多边形的、相同地设计并且具有几何中心点(9)的单元(8)的角点(8′)上，其中，所述单元(8)的边缘(8")</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB0zCxSyMzLSS1RSM1JzU3NK1FIyy9ScA5zUShKTUwuyS_iYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhiZGZpaWZhaOxsSoAQAzgCT6</recordid><startdate>20220401</startdate><enddate>20220401</enddate><creator>SCHON OLIVER</creator><scope>EVB</scope></search><sort><creationdate>20220401</creationdate><title>Air inlet element for CVD reactor</title><author>SCHON OLIVER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN114269968A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHON OLIVER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHON OLIVER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Air inlet element for CVD reactor</title><date>2022-04-01</date><risdate>2022</risdate><abstract>The invention relates to a venting surface (16) for a gas inlet element (2) of a CVD reactor (1) or for a cover plate (14) of a gas inlet element (2), comprising a plurality of venting openings (7, 17) arranged around a center (10), the midpoints (8 ') of the venting openings (7, 17) lying on the angular points (8') of a polygonal, identically designed unit (8) having a geometric center point (9), according to the invention, the edges (8 ") of the cells (8) are defined by intersecting reference lines (13, 13 ', 13"), the reference lines (13, 13', 13 ") are associated with at least two line groups, and the reference lines of the line groups each run straightly and parallel to one another over the entire exhaust surface. According to the invention, the center (10) is spaced from the corner (8 ') by a distance of 1/3 +/-10% of the length of the edge.
本发明涉及一种用于CVD反应器(1)的进气元件(2)或者用于进气元件(2)的遮护板(14)的排气面(16)，所述排气面具有多个围绕中心(10)布置的排气开口(7、17)，其中，所述排气开口(7、17)的中点(8′)位于呈多边形的、相同地设计并且具有几何中心点(9)的单元(8)的角点(8′)上，其中，所述单元(8)的边缘(8")</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Air inlet element for CVD reactor |
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