Method for rapidly judging wettability of glass powder and silicon substrate
The invention discloses a method for quickly judging the wettability of glass powder and a silicon substrate, and relates to a method for evaluating the wettability of the glass powder and the silicon substrate. The invention aims to solve the problems that the contact angle of a sample is measured...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a method for quickly judging the wettability of glass powder and a silicon substrate, and relates to a method for evaluating the wettability of the glass powder and the silicon substrate. The invention aims to solve the problems that the contact angle of a sample is measured in a conventional wettability evaluation method, the contact angle greatly fluctuates along with different test regions and test temperatures, errors exist between the contact angle and an actual value, and the wettability cannot be accurately judged. The method comprises the following steps: 1, sample preparation; and 2, data fitting. According to the invention, MATLAB software is utilized to process a video that the glass powder is melted at a high temperature, analysis is carried out through processing data, an accurate analysis method is established, and the wettability of the glass powder on the silicon substrate can be rapidly judged; and the method is simple and rapid in process, the wettability of the glass |
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