APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT
Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to...
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| creator | SMAKMAN ERWIN PAUL MANGNUS ALBERTUS V. G GOOSEN MAIKEL ROBERT |
| description | Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.
公开了在多射束装置中测量射束电流的系统和方法。该多射束装置可以包括带电粒子源，该带电粒子源被配置为生成初级带电粒子束，以及孔径阵列。孔径阵列可以包括多个孔径，该多个孔径被配置为由初级带电粒子束形成多个子束；以及检测器，该检测器包括用以检测辐射孔径阵列的初级带电粒子束的至少一部分的电流的电路系统。测量射束电流的方法可以包括：将初级带电粒子束辐射在孔径阵列上并且检测初级带电粒子束的至少一部分的电流。 |
| format | Patent |
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公开了在多射束装置中测量射束电流的系统和方法。该多射束装置可以包括带电粒子源，该带电粒子源被配置为生成初级带电粒子束，以及孔径阵列。孔径阵列可以包括多个孔径，该多个孔径被配置为由初级带电粒子束形成多个子束；以及检测器，该检测器包括用以检测辐射孔径阵列的初级带电粒子束的至少一部分的电流的电路系统。测量射束电流的方法可以包括：将初级带电粒子束辐射在孔径阵列上并且检测初级带电粒子束的至少一部分的电流。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211119&DB=EPODOC&CC=CN&NR=113678225A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211119&DB=EPODOC&CC=CN&NR=113678225A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SMAKMAN ERWIN PAUL</creatorcontrib><creatorcontrib>MANGNUS ALBERTUS V. G</creatorcontrib><creatorcontrib>GOOSEN MAIKEL ROBERT</creatorcontrib><title>APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT</title><description>Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.
公开了在多射束装置中测量射束电流的系统和方法。该多射束装置可以包括带电粒子源，该带电粒子源被配置为生成初级带电粒子束，以及孔径阵列。孔径阵列可以包括多个孔径，该多个孔径被配置为由初级带电粒子束形成多个子束；以及检测器，该检测器包括用以检测辐射孔径阵列的初级带电粒子束的至少一部分的电流的电路系统。测量射束电流的方法可以包括：将初级带电粒子束辐射在孔径阵列上并且检测初级带电粒子束的至少一部分的电流。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDByDHANCgkNclVwDApyjFQI9wzxUPD0C3F1D3IMcXVRcA4NCnL1C1HwdXUMBqryBbJ5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hobGZuYWRkamjMTFqAJ_nJzI</recordid><startdate>20211119</startdate><enddate>20211119</enddate><creator>SMAKMAN ERWIN PAUL</creator><creator>MANGNUS ALBERTUS V. G</creator><creator>GOOSEN MAIKEL ROBERT</creator><scope>EVB</scope></search><sort><creationdate>20211119</creationdate><title>APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT</title><author>SMAKMAN ERWIN PAUL ; MANGNUS ALBERTUS V. G ; GOOSEN MAIKEL ROBERT</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN113678225A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>SMAKMAN ERWIN PAUL</creatorcontrib><creatorcontrib>MANGNUS ALBERTUS V. G</creatorcontrib><creatorcontrib>GOOSEN MAIKEL ROBERT</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SMAKMAN ERWIN PAUL</au><au>MANGNUS ALBERTUS V. G</au><au>GOOSEN MAIKEL ROBERT</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT</title><date>2021-11-19</date><risdate>2021</risdate><abstract>Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.
公开了在多射束装置中测量射束电流的系统和方法。该多射束装置可以包括带电粒子源，该带电粒子源被配置为生成初级带电粒子束，以及孔径阵列。孔径阵列可以包括多个孔径，该多个孔径被配置为由初级带电粒子束形成多个子束；以及检测器，该检测器包括用以检测辐射孔径阵列的初级带电粒子束的至少一部分的电流的电路系统。测量射束电流的方法可以包括：将初级带电粒子束辐射在孔径阵列上并且检测初级带电粒子束的至少一部分的电流。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
| title | APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT |
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