Method for producing sintered body and method for producing sputtering target

The purpose of the present invention is to provide a method for producing a sintered body and a method for producing a sputtering target, whereby it is possible to easily produce a sintered body in which cracking is suppressed. The method for producing a sintered body according to one embodiment of...

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1. Verfasser: TAO YUKI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The purpose of the present invention is to provide a method for producing a sintered body and a method for producing a sputtering target, whereby it is possible to easily produce a sintered body in which cracking is suppressed. The method for producing a sintered body according to one embodiment of the present invention comprises: a step for forming a granulated material of a starting material powder containing a metal powder and a metal oxide powder and a step for calcining the granulated material. The starting material powder contains Mn, Cu and Zn as metal elements; the volume ratio of the metal powder in the raw material powder is 28.0% by volume or more, and the sintering pressure in the calcining step is 20 MPa or more. 本发明的目的在于提供一种能够容易地制造龟裂得到抑制的烧结体的烧结体的制造方法及溅射靶的制造方法。本发明的一实施方式的烧结体的制造方法包括:形成包含金属粉末及金属氧化物粉末的原料粉末的造粒物的步骤、以及对所述造粒物进行煅烧的步骤,所述原料粉末包含Mn、Cu及Zn作为金属元素,所述原料粉末中的所述金属粉末的体积比率为28.0体积%以上,所述煅烧步骤中的烧结压力为20MPa以上。