Ultrathin vapor chamber, preparation method thereof and electronic equipment

The invention relates to an ultrathin vapor chamber, a preparation method thereof and electronic equipment, and the vapor chamber comprises a first cover plate and a second cover plate. The first cover plate and the second cover plate are connected in a sealed mode to form a sealed cavity, a negativ...

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Hauptverfasser: WANG YINGXIAN, DUAN LONGHUA, NIE CONG, TANG YONG, LIU YONGLU, CHEN GONG, FAN DONGQIANG, JIN LINFANG
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creator WANG YINGXIAN
DUAN LONGHUA
NIE CONG
TANG YONG
LIU YONGLU
CHEN GONG
FAN DONGQIANG
JIN LINFANG
description The invention relates to an ultrathin vapor chamber, a preparation method thereof and electronic equipment, and the vapor chamber comprises a first cover plate and a second cover plate. The first cover plate and the second cover plate are connected in a sealed mode to form a sealed cavity, a negative pressure environment is formed in the sealed cavity, a capillary structure and a cooling medium are arranged in the sealed cavity, and the inner surface of the first cover plate and/or the inner surface of the second cover plate and/or the capillary structure comprise/comprises a hydrophobic structure layer and a hydrophilic structure layer. The hydrophobic structure layer is obtained by performing surface hydrophobization treatment on the first cover plate and/or the second cover plate and/or the capillary structure after etching or deposition or film layer treatment. According to the ultrathin vapor chamber provided by the embodiment of the invention, the formation of a liquid film can be effectively prevented
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subjects CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
PRINTED CIRCUITS
title Ultrathin vapor chamber, preparation method thereof and electronic equipment
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