Film thickness measurement system, film thickness measurement method, and storage medium

A film thickness measurement system acquires spectroscopic data relating to first positions on the surfaces of N first substrates on which first films having different film thicknesses are formed, and acquires the film thickness of the first films at the first position for each of the N first substr...

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Bibliographische Detailangaben

1. Verfasser:	UMEHARA YASUTOSHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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