PLASMA TREATMENTS FOR FLEXURES OF HARD DISK DRIVES
Methods for producing flexible circuits can include creating treating a surface of the flexible circuit with at least one of an atmospheric plasma and a beam of ions. The atmospheric plasma is formedby directing a flow of gas between an electrode and the surface of the flexible circuit and generatin...
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| creator | HORNER MATTHEW J LADWIG PETER F PESAVENTO PAUL V SYDLO DARRELL C TOBIAS KYLE T SMAHEL DAVID D SPERL CHRISTOPHER J TIWARI RITESH K MINTON CARL C HAAS ALEX W YUSUF MARYAM O FISCHER KURT F |
| description | Methods for producing flexible circuits can include creating treating a surface of the flexible circuit with at least one of an atmospheric plasma and a beam of ions. The atmospheric plasma is formedby directing a flow of gas between an electrode and the surface of the flexible circuit and generating a voltage between the electrode and the flexible circuit to create a plasma from the gas. A meanion energy of the ions in the ion beam ranges from about 500 electron volts to about 1,500 electron volts.
一种用于制造柔性电路的方法可包括利用大气等离子体和离子束中的至少一种对柔性电路的表面进行处理。大气等离子体被通过将气体流引导到电机和柔性电路的该表面之间并在电机和柔性电路之间生成电压以便从该气体产生等离子体而形成。离子的平均离子能量从约500电子伏特变化到约1,500电子伏特。 |
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一种用于制造柔性电路的方法可包括利用大气等离子体和离子束中的至少一种对柔性电路的表面进行处理。大气等离子体被通过将气体流引导到电机和柔性电路的该表面之间并在电机和柔性电路之间生成电压以便从该气体产生等离子体而形成。离子的平均离子能量从约500电子伏特变化到约1,500电子伏特。</description><language>chi ; eng</language><subject>APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; METALLURGY ; PHYSICS ; PRINTED CIRCUITS ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210910&DB=EPODOC&CC=CN&NR=113382551A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210910&DB=EPODOC&CC=CN&NR=113382551A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HORNER MATTHEW J</creatorcontrib><creatorcontrib>LADWIG PETER F</creatorcontrib><creatorcontrib>PESAVENTO PAUL V</creatorcontrib><creatorcontrib>SYDLO DARRELL C</creatorcontrib><creatorcontrib>TOBIAS KYLE T</creatorcontrib><creatorcontrib>SMAHEL DAVID D</creatorcontrib><creatorcontrib>SPERL CHRISTOPHER J</creatorcontrib><creatorcontrib>TIWARI RITESH K</creatorcontrib><creatorcontrib>MINTON CARL C</creatorcontrib><creatorcontrib>HAAS ALEX W</creatorcontrib><creatorcontrib>YUSUF MARYAM O</creatorcontrib><creatorcontrib>FISCHER KURT F</creatorcontrib><title>PLASMA TREATMENTS FOR FLEXURES OF HARD DISK DRIVES</title><description>Methods for producing flexible circuits can include creating treating a surface of the flexible circuit with at least one of an atmospheric plasma and a beam of ions. The atmospheric plasma is formedby directing a flow of gas between an electrode and the surface of the flexible circuit and generating a voltage between the electrode and the flexible circuit to create a plasma from the gas. A meanion energy of the ions in the ion beam ranges from about 500 electron volts to about 1,500 electron volts.
一种用于制造柔性电路的方法可包括利用大气等离子体和离子束中的至少一种对柔性电路的表面进行处理。大气等离子体被通过将气体流引导到电机和柔性电路的该表面之间并在电机和柔性电路之间生成电压以便从该气体产生等离子体而形成。离子的平均离子能量从约500电子伏特变化到约1,500电子伏特。</description><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>PRINTED CIRCUITS</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAK8HEM9nVUCAlydQzxdfULCVZw8w9ScPNxjQgNcg1W8HdT8HAMclFw8Qz2VnAJ8gxzDeZhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoaGxsYWRqamho7GxKgBAHOqJrk</recordid><startdate>20210910</startdate><enddate>20210910</enddate><creator>HORNER MATTHEW J</creator><creator>LADWIG PETER F</creator><creator>PESAVENTO PAUL V</creator><creator>SYDLO DARRELL C</creator><creator>TOBIAS KYLE T</creator><creator>SMAHEL DAVID D</creator><creator>SPERL CHRISTOPHER J</creator><creator>TIWARI RITESH K</creator><creator>MINTON CARL C</creator><creator>HAAS ALEX W</creator><creator>YUSUF MARYAM O</creator><creator>FISCHER KURT F</creator><scope>EVB</scope></search><sort><creationdate>20210910</creationdate><title>PLASMA TREATMENTS FOR FLEXURES OF HARD DISK DRIVES</title><author>HORNER MATTHEW J ; LADWIG PETER F ; PESAVENTO PAUL V ; SYDLO DARRELL C ; TOBIAS KYLE T ; SMAHEL DAVID D ; SPERL CHRISTOPHER J ; TIWARI RITESH K ; MINTON CARL C ; HAAS ALEX W ; YUSUF MARYAM O ; FISCHER KURT F</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN113382551A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>PRINTED CIRCUITS</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>HORNER MATTHEW J</creatorcontrib><creatorcontrib>LADWIG PETER F</creatorcontrib><creatorcontrib>PESAVENTO PAUL V</creatorcontrib><creatorcontrib>SYDLO DARRELL C</creatorcontrib><creatorcontrib>TOBIAS KYLE T</creatorcontrib><creatorcontrib>SMAHEL DAVID D</creatorcontrib><creatorcontrib>SPERL CHRISTOPHER J</creatorcontrib><creatorcontrib>TIWARI RITESH K</creatorcontrib><creatorcontrib>MINTON CARL C</creatorcontrib><creatorcontrib>HAAS ALEX W</creatorcontrib><creatorcontrib>YUSUF MARYAM O</creatorcontrib><creatorcontrib>FISCHER KURT F</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HORNER MATTHEW J</au><au>LADWIG PETER F</au><au>PESAVENTO PAUL V</au><au>SYDLO DARRELL C</au><au>TOBIAS KYLE T</au><au>SMAHEL DAVID D</au><au>SPERL CHRISTOPHER J</au><au>TIWARI RITESH K</au><au>MINTON CARL C</au><au>HAAS ALEX W</au><au>YUSUF MARYAM O</au><au>FISCHER KURT F</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLASMA TREATMENTS FOR FLEXURES OF HARD DISK DRIVES</title><date>2021-09-10</date><risdate>2021</risdate><abstract>Methods for producing flexible circuits can include creating treating a surface of the flexible circuit with at least one of an atmospheric plasma and a beam of ions. The atmospheric plasma is formedby directing a flow of gas between an electrode and the surface of the flexible circuit and generating a voltage between the electrode and the flexible circuit to create a plasma from the gas. A meanion energy of the ions in the ion beam ranges from about 500 electron volts to about 1,500 electron volts.
一种用于制造柔性电路的方法可包括利用大气等离子体和离子束中的至少一种对柔性电路的表面进行处理。大气等离子体被通过将气体流引导到电机和柔性电路的该表面之间并在电机和柔性电路之间生成电压以便从该气体产生等离子体而形成。离子的平均离子能量从约500电子伏特变化到约1,500电子伏特。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PHYSICS PRINTED CIRCUITS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PLASMA TREATMENTS FOR FLEXURES OF HARD DISK DRIVES |
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