Method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid
The invention discloses a method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid, which comprises the following steps: preparing a manganese chloride solution, adding colloidal sulfur with the mass volume concentration of 10-14 g/L into the prepa...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | QI SHIQING SONG BAOSHENG WANG FEIRAN ZHI FUPENG CAI LEI WU FANG CAO DUMENG XIE YI ZHUANG YURU WANG QIAN WU JING HAO YALI HE YAN FENG XIAORUI WANG JUANHUI |
description | The invention discloses a method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid, which comprises the following steps: preparing a manganese chloride solution, adding colloidal sulfur with the mass volume concentration of 10-14 g/L into the prepared manganese chloride solution, fully stirring and uniformly mixing at normal temperature, and adjusting the pH value of the solution to 5.0 with ammonia water to obtain the electrodeposition liquid; and then pouring the electrodeposition liquid into an electrodeposition cell, adjusting the temperature of the electrodeposition cell, the direct current density of a cathode plate and an anode plate and the electrodeposition voltage, conducting electrodeposition for 24 h, and obtaining high-purity manganese with the purity ranging from 99.99% to 99.999%. According to the method of the invention, the high-purity manganese chloride and the high-purity ammonium chloride are used as raw materials to be blended into the s |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN113293408A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN113293408A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN113293408A3</originalsourceid><addsrcrecordid>eNqNjLEKwjAQQLM4iPoP5wcUrHHQUYriopN7CcmlOUhzNbkO_XsdFDo6PR483lLFO0pgB54zYEQrmeMkZMHhwIWEOAF7CNSFahgzyQS9SZ1JWBB85n6mNkTO5PA3mi0ivUZya7XwJhbcfLlS2-vl2dyqT9hiGYzFhNI2j7rW-5M-7I5n_U_zBsLRQwk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid</title><source>esp@cenet</source><creator>QI SHIQING ; SONG BAOSHENG ; WANG FEIRAN ; ZHI FUPENG ; CAI LEI ; WU FANG ; CAO DUMENG ; XIE YI ; ZHUANG YURU ; WANG QIAN ; WU JING ; HAO YALI ; HE YAN ; FENG XIAORUI ; WANG JUANHUI</creator><creatorcontrib>QI SHIQING ; SONG BAOSHENG ; WANG FEIRAN ; ZHI FUPENG ; CAI LEI ; WU FANG ; CAO DUMENG ; XIE YI ; ZHUANG YURU ; WANG QIAN ; WU JING ; HAO YALI ; HE YAN ; FENG XIAORUI ; WANG JUANHUI</creatorcontrib><description>The invention discloses a method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid, which comprises the following steps: preparing a manganese chloride solution, adding colloidal sulfur with the mass volume concentration of 10-14 g/L into the prepared manganese chloride solution, fully stirring and uniformly mixing at normal temperature, and adjusting the pH value of the solution to 5.0 with ammonia water to obtain the electrodeposition liquid; and then pouring the electrodeposition liquid into an electrodeposition cell, adjusting the temperature of the electrodeposition cell, the direct current density of a cathode plate and an anode plate and the electrodeposition voltage, conducting electrodeposition for 24 h, and obtaining high-purity manganese with the purity ranging from 99.99% to 99.999%. According to the method of the invention, the high-purity manganese chloride and the high-purity ammonium chloride are used as raw materials to be blended into the s</description><language>chi ; eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY ORREFINING OF METALS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210824&DB=EPODOC&CC=CN&NR=113293408A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210824&DB=EPODOC&CC=CN&NR=113293408A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>QI SHIQING</creatorcontrib><creatorcontrib>SONG BAOSHENG</creatorcontrib><creatorcontrib>WANG FEIRAN</creatorcontrib><creatorcontrib>ZHI FUPENG</creatorcontrib><creatorcontrib>CAI LEI</creatorcontrib><creatorcontrib>WU FANG</creatorcontrib><creatorcontrib>CAO DUMENG</creatorcontrib><creatorcontrib>XIE YI</creatorcontrib><creatorcontrib>ZHUANG YURU</creatorcontrib><creatorcontrib>WANG QIAN</creatorcontrib><creatorcontrib>WU JING</creatorcontrib><creatorcontrib>HAO YALI</creatorcontrib><creatorcontrib>HE YAN</creatorcontrib><creatorcontrib>FENG XIAORUI</creatorcontrib><creatorcontrib>WANG JUANHUI</creatorcontrib><title>Method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid</title><description>The invention discloses a method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid, which comprises the following steps: preparing a manganese chloride solution, adding colloidal sulfur with the mass volume concentration of 10-14 g/L into the prepared manganese chloride solution, fully stirring and uniformly mixing at normal temperature, and adjusting the pH value of the solution to 5.0 with ammonia water to obtain the electrodeposition liquid; and then pouring the electrodeposition liquid into an electrodeposition cell, adjusting the temperature of the electrodeposition cell, the direct current density of a cathode plate and an anode plate and the electrodeposition voltage, conducting electrodeposition for 24 h, and obtaining high-purity manganese with the purity ranging from 99.99% to 99.999%. According to the method of the invention, the high-purity manganese chloride and the high-purity ammonium chloride are used as raw materials to be blended into the s</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY ORREFINING OF METALS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjLEKwjAQQLM4iPoP5wcUrHHQUYriopN7CcmlOUhzNbkO_XsdFDo6PR483lLFO0pgB54zYEQrmeMkZMHhwIWEOAF7CNSFahgzyQS9SZ1JWBB85n6mNkTO5PA3mi0ivUZya7XwJhbcfLlS2-vl2dyqT9hiGYzFhNI2j7rW-5M-7I5n_U_zBsLRQwk</recordid><startdate>20210824</startdate><enddate>20210824</enddate><creator>QI SHIQING</creator><creator>SONG BAOSHENG</creator><creator>WANG FEIRAN</creator><creator>ZHI FUPENG</creator><creator>CAI LEI</creator><creator>WU FANG</creator><creator>CAO DUMENG</creator><creator>XIE YI</creator><creator>ZHUANG YURU</creator><creator>WANG QIAN</creator><creator>WU JING</creator><creator>HAO YALI</creator><creator>HE YAN</creator><creator>FENG XIAORUI</creator><creator>WANG JUANHUI</creator><scope>EVB</scope></search><sort><creationdate>20210824</creationdate><title>Method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid</title><author>QI SHIQING ; SONG BAOSHENG ; WANG FEIRAN ; ZHI FUPENG ; CAI LEI ; WU FANG ; CAO DUMENG ; XIE YI ; ZHUANG YURU ; WANG QIAN ; WU JING ; HAO YALI ; HE YAN ; FENG XIAORUI ; WANG JUANHUI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN113293408A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY ORREFINING OF METALS</topic><toplevel>online_resources</toplevel><creatorcontrib>QI SHIQING</creatorcontrib><creatorcontrib>SONG BAOSHENG</creatorcontrib><creatorcontrib>WANG FEIRAN</creatorcontrib><creatorcontrib>ZHI FUPENG</creatorcontrib><creatorcontrib>CAI LEI</creatorcontrib><creatorcontrib>WU FANG</creatorcontrib><creatorcontrib>CAO DUMENG</creatorcontrib><creatorcontrib>XIE YI</creatorcontrib><creatorcontrib>ZHUANG YURU</creatorcontrib><creatorcontrib>WANG QIAN</creatorcontrib><creatorcontrib>WU JING</creatorcontrib><creatorcontrib>HAO YALI</creatorcontrib><creatorcontrib>HE YAN</creatorcontrib><creatorcontrib>FENG XIAORUI</creatorcontrib><creatorcontrib>WANG JUANHUI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>QI SHIQING</au><au>SONG BAOSHENG</au><au>WANG FEIRAN</au><au>ZHI FUPENG</au><au>CAI LEI</au><au>WU FANG</au><au>CAO DUMENG</au><au>XIE YI</au><au>ZHUANG YURU</au><au>WANG QIAN</au><au>WU JING</au><au>HAO YALI</au><au>HE YAN</au><au>FENG XIAORUI</au><au>WANG JUANHUI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid</title><date>2021-08-24</date><risdate>2021</risdate><abstract>The invention discloses a method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid, which comprises the following steps: preparing a manganese chloride solution, adding colloidal sulfur with the mass volume concentration of 10-14 g/L into the prepared manganese chloride solution, fully stirring and uniformly mixing at normal temperature, and adjusting the pH value of the solution to 5.0 with ammonia water to obtain the electrodeposition liquid; and then pouring the electrodeposition liquid into an electrodeposition cell, adjusting the temperature of the electrodeposition cell, the direct current density of a cathode plate and an anode plate and the electrodeposition voltage, conducting electrodeposition for 24 h, and obtaining high-purity manganese with the purity ranging from 99.99% to 99.999%. According to the method of the invention, the high-purity manganese chloride and the high-purity ammonium chloride are used as raw materials to be blended into the s</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN113293408A |
source | esp@cenet |
subjects | APPARATUS THEREFOR CHEMISTRY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY ORREFINING OF METALS |
title | Method for electrolytic deposition of high-purity manganese from manganese chloride electrodeposition liquid |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T01%3A04%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=QI%20SHIQING&rft.date=2021-08-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN113293408A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |