A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
A method for improving the yield of a lithographic process is provided, the method comprising: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a proces...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | MOS EVERHARDUS CORNELIS WALLERBOS ERIK JOHANNES MARIA STAALS FRANK WILDENBERG JO SEBASTIAAN VAN DER SCHAAR MAURITS ELICH FRANCISCUS HENDRICUS ARNOLDUS |
| description | A method for improving the yield of a lithographic process is provided, the method comprising: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated withan allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.
一种用于改善光刻过程的成品率的方法，所述方法包括：确定整个衬底的性能参数的参数指纹，所述参数指纹包括与所述性能参数的不确定性相关的信息；确定整个所述衬底的性能参数的过程窗口指纹，过程窗口与所述性能参数的可允许范围相关联；以及确定与所述性能参数在可允许范围之外的概率相关联的概率度量。可选地，基于所述概率度量来确定对所述光刻过程的校正。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN113253578A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN113253578A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN113253578A3</originalsourceid><addsrcrecordid>eNrjZDB2VPB1DfHwd1Fw8w9S8A8I8fT1jHIM8fT3U_B3U3BU8PEESroHOQZ4eDorBAT5O7sGB_MwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0NDYyNTY1NzC0djYtQAAI8aJwM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS</title><source>esp@cenet</source><creator>MOS EVERHARDUS CORNELIS ; WALLERBOS ERIK JOHANNES MARIA ; STAALS FRANK ; WILDENBERG JO SEBASTIAAN ; VAN DER SCHAAR MAURITS ; ELICH FRANCISCUS HENDRICUS ARNOLDUS</creator><creatorcontrib>MOS EVERHARDUS CORNELIS ; WALLERBOS ERIK JOHANNES MARIA ; STAALS FRANK ; WILDENBERG JO SEBASTIAAN ; VAN DER SCHAAR MAURITS ; ELICH FRANCISCUS HENDRICUS ARNOLDUS</creatorcontrib><description>A method for improving the yield of a lithographic process is provided, the method comprising: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated withan allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.
一种用于改善光刻过程的成品率的方法，所述方法包括：确定整个衬底的性能参数的参数指纹，所述参数指纹包括与所述性能参数的不确定性相关的信息；确定整个所述衬底的性能参数的过程窗口指纹，过程窗口与所述性能参数的可允许范围相关联；以及确定与所述性能参数在可允许范围之外的概率相关联的概率度量。可选地，基于所述概率度量来确定对所述光刻过程的校正。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210813&DB=EPODOC&CC=CN&NR=113253578A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210813&DB=EPODOC&CC=CN&NR=113253578A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MOS EVERHARDUS CORNELIS</creatorcontrib><creatorcontrib>WALLERBOS ERIK JOHANNES MARIA</creatorcontrib><creatorcontrib>STAALS FRANK</creatorcontrib><creatorcontrib>WILDENBERG JO SEBASTIAAN</creatorcontrib><creatorcontrib>VAN DER SCHAAR MAURITS</creatorcontrib><creatorcontrib>ELICH FRANCISCUS HENDRICUS ARNOLDUS</creatorcontrib><title>A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS</title><description>A method for improving the yield of a lithographic process is provided, the method comprising: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated withan allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.
一种用于改善光刻过程的成品率的方法，所述方法包括：确定整个衬底的性能参数的参数指纹，所述参数指纹包括与所述性能参数的不确定性相关的信息；确定整个所述衬底的性能参数的过程窗口指纹，过程窗口与所述性能参数的可允许范围相关联；以及确定与所述性能参数在可允许范围之外的概率相关联的概率度量。可选地，基于所述概率度量来确定对所述光刻过程的校正。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB2VPB1DfHwd1Fw8w9S8A8I8fT1jHIM8fT3U_B3U3BU8PEESroHOQZ4eDorBAT5O7sGB_MwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0NDYyNTY1NzC0djYtQAAI8aJwM</recordid><startdate>20210813</startdate><enddate>20210813</enddate><creator>MOS EVERHARDUS CORNELIS</creator><creator>WALLERBOS ERIK JOHANNES MARIA</creator><creator>STAALS FRANK</creator><creator>WILDENBERG JO SEBASTIAAN</creator><creator>VAN DER SCHAAR MAURITS</creator><creator>ELICH FRANCISCUS HENDRICUS ARNOLDUS</creator><scope>EVB</scope></search><sort><creationdate>20210813</creationdate><title>A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS</title><author>MOS EVERHARDUS CORNELIS ; WALLERBOS ERIK JOHANNES MARIA ; STAALS FRANK ; WILDENBERG JO SEBASTIAAN ; VAN DER SCHAAR MAURITS ; ELICH FRANCISCUS HENDRICUS ARNOLDUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN113253578A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MOS EVERHARDUS CORNELIS</creatorcontrib><creatorcontrib>WALLERBOS ERIK JOHANNES MARIA</creatorcontrib><creatorcontrib>STAALS FRANK</creatorcontrib><creatorcontrib>WILDENBERG JO SEBASTIAAN</creatorcontrib><creatorcontrib>VAN DER SCHAAR MAURITS</creatorcontrib><creatorcontrib>ELICH FRANCISCUS HENDRICUS ARNOLDUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MOS EVERHARDUS CORNELIS</au><au>WALLERBOS ERIK JOHANNES MARIA</au><au>STAALS FRANK</au><au>WILDENBERG JO SEBASTIAAN</au><au>VAN DER SCHAAR MAURITS</au><au>ELICH FRANCISCUS HENDRICUS ARNOLDUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS</title><date>2021-08-13</date><risdate>2021</risdate><abstract>A method for improving the yield of a lithographic process is provided, the method comprising: determining a parameter fingerprint of a performance parameter across a substrate, the parameter fingerprint including information relating to uncertainty in the performance parameter; determining a process window fingerprint of the performance parameter across the substrate, the process window being associated withan allowable range of the performance parameter; and determining a probability metric associated with the probability of the performance parameter being outside an allowable range. Optionally a correction to the lithographic process is determined based on the probability metric.
一种用于改善光刻过程的成品率的方法，所述方法包括：确定整个衬底的性能参数的参数指纹，所述参数指纹包括与所述性能参数的不确定性相关的信息；确定整个所述衬底的性能参数的过程窗口指纹，过程窗口与所述性能参数的可允许范围相关联；以及确定与所述性能参数在可允许范围之外的概率相关联的概率度量。可选地，基于所述概率度量来确定对所述光刻过程的校正。</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN113253578A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T11%3A07%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MOS%20EVERHARDUS%20CORNELIS&rft.date=2021-08-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN113253578A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |