Photoresist coating device and photoresist coating method

A photoresist coating device comprises a chuck, a photoresist nozzle, a cleaning agent nozzle, an edge exposure light source, a developing agent nozzle and an adjusting mechanism, wherein the chuck positions a wafer and drives the wafer to rotate, the photoresist nozzle sprays photoresist to the waf...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN ZHONGJI, ZHANG CHENGGEN, TIAN FANHUAN, JIN ZAIZHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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