CRYOGENIC ELECTROSTATIC CHUCK
Embodiments described herein relate to a substrate support assembly which enables a cryogenic temperature operation of an electrostatic chuck (ESC) so that a substrate disposed thereon is maintained at a cryogenic processing temperature suitable for processing while other surfaces of a processing ch...
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| creator | SCHMIDT ALEXANDER NOUJAIM ANDREW ANTOINE SARODE VISHWANATH YOGANANDA PROUTY STEPHEN DONALD BABAYAN STEVE E GARCIA DE GORORDO ALVARO |
| description | Embodiments described herein relate to a substrate support assembly which enables a cryogenic temperature operation of an electrostatic chuck (ESC) so that a substrate disposed thereon is maintained at a cryogenic processing temperature suitable for processing while other surfaces of a processing chamber are maintained at a different temperature. The substrate support assembly includes an electrostatic chuck (ESC), an ESC base assembly coupled to the ESC having a base channel disposed therein, and a facility plate having a facility channel disposed therein. The facility plate includes a plate portion and a wall portion. The plate portion is coupled to the ESC base assembly and the wall portion coupled to the ESC with a seal assembly. A vacuum region is defined by the ESC, the ESC base assembly, the plate portion of the facility plate, the wall portion of the facility plate, and the seal assembly.
本文所述实施例涉及一种基板支撑组件，所述基板支撑组件实现静电吸盘(ESC)的低温操作，使得设置在静电吸盘(ESC)上的基板被维持在适用于处理的低温处理温度，同时将处理腔室的其他表面维持在不同的温度。基板支撑组件包含：静电吸盘(E |
| format | Patent |
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本文所述实施例涉及一种基板支撑组件，所述基板支撑组件实现静电吸盘(ESC)的低温操作，使得设置在静电吸盘(ESC)上的基板被维持在适用于处理的低温处理温度，同时将处理腔室的其他表面维持在不同的温度。基板支撑组件包含：静电吸盘(E</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERATION ; SEMICONDUCTOR DEVICES</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210615&DB=EPODOC&CC=CN&NR=112970100A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210615&DB=EPODOC&CC=CN&NR=112970100A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHMIDT ALEXANDER</creatorcontrib><creatorcontrib>NOUJAIM ANDREW ANTOINE</creatorcontrib><creatorcontrib>SARODE VISHWANATH YOGANANDA</creatorcontrib><creatorcontrib>PROUTY STEPHEN DONALD</creatorcontrib><creatorcontrib>BABAYAN STEVE E</creatorcontrib><creatorcontrib>GARCIA DE GORORDO ALVARO</creatorcontrib><title>CRYOGENIC ELECTROSTATIC CHUCK</title><description>Embodiments described herein relate to a substrate support assembly which enables a cryogenic temperature operation of an electrostatic chuck (ESC) so that a substrate disposed thereon is maintained at a cryogenic processing temperature suitable for processing while other surfaces of a processing chamber are maintained at a different temperature. The substrate support assembly includes an electrostatic chuck (ESC), an ESC base assembly coupled to the ESC having a base channel disposed therein, and a facility plate having a facility channel disposed therein. The facility plate includes a plate portion and a wall portion. The plate portion is coupled to the ESC base assembly and the wall portion coupled to the ESC with a seal assembly. A vacuum region is defined by the ESC, the ESC base assembly, the plate portion of the facility plate, the wall portion of the facility plate, and the seal assembly.
本文所述实施例涉及一种基板支撑组件，所述基板支撑组件实现静电吸盘(ESC)的低温操作，使得设置在静电吸盘(ESC)上的基板被维持在适用于处理的低温处理温度，同时将处理腔室的其他表面维持在不同的温度。基板支撑组件包含：静电吸盘(E</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</subject><subject>ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GENERATION</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB1Dor0d3f183RWcPVxdQ4J8g8OcQwB8pw9Qp29eRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvLOfoaGRpbmBoYGBozExagCcOiEV</recordid><startdate>20210615</startdate><enddate>20210615</enddate><creator>SCHMIDT ALEXANDER</creator><creator>NOUJAIM ANDREW ANTOINE</creator><creator>SARODE VISHWANATH YOGANANDA</creator><creator>PROUTY STEPHEN DONALD</creator><creator>BABAYAN STEVE E</creator><creator>GARCIA DE GORORDO ALVARO</creator><scope>EVB</scope></search><sort><creationdate>20210615</creationdate><title>CRYOGENIC ELECTROSTATIC CHUCK</title><author>SCHMIDT ALEXANDER ; NOUJAIM ANDREW ANTOINE ; SARODE VISHWANATH YOGANANDA ; PROUTY STEPHEN DONALD ; BABAYAN STEVE E ; GARCIA DE GORORDO ALVARO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN112970100A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CONVERSION OR DISTRIBUTION OF ELECTRIC POWER</topic><topic>ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERATION</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHMIDT ALEXANDER</creatorcontrib><creatorcontrib>NOUJAIM ANDREW ANTOINE</creatorcontrib><creatorcontrib>SARODE VISHWANATH YOGANANDA</creatorcontrib><creatorcontrib>PROUTY STEPHEN DONALD</creatorcontrib><creatorcontrib>BABAYAN STEVE E</creatorcontrib><creatorcontrib>GARCIA DE GORORDO ALVARO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHMIDT ALEXANDER</au><au>NOUJAIM ANDREW ANTOINE</au><au>SARODE VISHWANATH YOGANANDA</au><au>PROUTY STEPHEN DONALD</au><au>BABAYAN STEVE E</au><au>GARCIA DE GORORDO ALVARO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CRYOGENIC ELECTROSTATIC CHUCK</title><date>2021-06-15</date><risdate>2021</risdate><abstract>Embodiments described herein relate to a substrate support assembly which enables a cryogenic temperature operation of an electrostatic chuck (ESC) so that a substrate disposed thereon is maintained at a cryogenic processing temperature suitable for processing while other surfaces of a processing chamber are maintained at a different temperature. The substrate support assembly includes an electrostatic chuck (ESC), an ESC base assembly coupled to the ESC having a base channel disposed therein, and a facility plate having a facility channel disposed therein. The facility plate includes a plate portion and a wall portion. The plate portion is coupled to the ESC base assembly and the wall portion coupled to the ESC with a seal assembly. A vacuum region is defined by the ESC, the ESC base assembly, the plate portion of the facility plate, the wall portion of the facility plate, and the seal assembly.
本文所述实施例涉及一种基板支撑组件，所述基板支撑组件实现静电吸盘(ESC)的低温操作，使得设置在静电吸盘(ESC)上的基板被维持在适用于处理的低温处理温度，同时将处理腔室的其他表面维持在不同的温度。基板支撑组件包含：静电吸盘(E</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION SEMICONDUCTOR DEVICES |
| title | CRYOGENIC ELECTROSTATIC CHUCK |
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