SEMICONDUCTOR DEVICE
The invention relates to a semiconductor device. Provided is a nonvolatile memory having a small area and sufficient capacitance. The semiconductor device constituting the non-volatile memory includes a semiconductor portion of a first conductivity type; a first well of a second conductivity type, w...
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creator | MAEDA KANTA |
description | The invention relates to a semiconductor device. Provided is a nonvolatile memory having a small area and sufficient capacitance. The semiconductor device constituting the non-volatile memory includes a semiconductor portion of a first conductivity type; a first well of a second conductivity type, which has a polarity opposite to that of the first conductivity type, and is formed so as to extend inward from a first region within one surface of the semiconductor section; a second well of a second conductivity type formed so as to be separated from the first region and extending inward from a second region within the one surface of the semiconductor part; an insulating film formed on one surface; and a conductive layer formed so as to extend across a region above the first well and a region above the second well on the insulating film. In the first well, a trench extending from one surface to the inside of the first well is formed, and the insulating film extends on the inner surface of the trench. A conductive |
format | Patent |
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The semiconductor device constituting the non-volatile memory includes a semiconductor portion of a first conductivity type; a first well of a second conductivity type, which has a polarity opposite to that of the first conductivity type, and is formed so as to extend inward from a first region within one surface of the semiconductor section; a second well of a second conductivity type formed so as to be separated from the first region and extending inward from a second region within the one surface of the semiconductor part; an insulating film formed on one surface; and a conductive layer formed so as to extend across a region above the first well and a region above the second well on the insulating film. In the first well, a trench extending from one surface to the inside of the first well is formed, and the insulating film extends on the inner surface of the trench. 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Provided is a nonvolatile memory having a small area and sufficient capacitance. The semiconductor device constituting the non-volatile memory includes a semiconductor portion of a first conductivity type; a first well of a second conductivity type, which has a polarity opposite to that of the first conductivity type, and is formed so as to extend inward from a first region within one surface of the semiconductor section; a second well of a second conductivity type formed so as to be separated from the first region and extending inward from a second region within the one surface of the semiconductor part; an insulating film formed on one surface; and a conductive layer formed so as to extend across a region above the first well and a region above the second well on the insulating film. In the first well, a trench extending from one surface to the inside of the first well is formed, and the insulating film extends on the inner surface of the trench. 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language | chi ; eng |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | SEMICONDUCTOR DEVICE |
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