Monocrystalline-silicon-like wafer preparation device
The invention discloses a monocrystalline silicon-like wafer preparation device, and belongs to the field of crystal production. The preparation device comprises a base, sliding grooves A are formed in the two sides of the center of the base, sliding blocks A are slidably arranged in the sliding gro...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | LAI WEISHENG GU XIABIN YANG SHIHAO |
description | The invention discloses a monocrystalline silicon-like wafer preparation device, and belongs to the field of crystal production. The preparation device comprises a base, sliding grooves A are formed in the two sides of the center of the base, sliding blocks A are slidably arranged in the sliding grooves A, springs are fixedly arranged in the sliding grooves A and at the outer ends of the sliding blocks A, and clamps are fixedly arranged at the upper ends of the sliding blocks A and penetrate through the sliding grooves A; and side plates are fixedly installed on the outer walls of the upper ends of the left side and the right side of the base, a motor A is fixedly installed at the upper end of the side plate on the left side of the base, the lower end of the motor A penetrates through theside plates and is rotationally provided with a screw A, the outer wall of the screw A is rotationally sleeved with a threaded sleeve A, and limiting rings A are fixedly installed on the upper and lower sides of the threaded |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN112454702A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN112454702A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN112454702A3</originalsourceid><addsrcrecordid>eNrjZDD1zc_LTy6qLC5JzMnJzEvVLc7MyUzOz9PNycxOVShPTEstUigoSi1ILEosyczPU0hJLctMTuVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoaGRiamJuYGRo7GxKgBALx5Lc0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Monocrystalline-silicon-like wafer preparation device</title><source>esp@cenet</source><creator>LAI WEISHENG ; GU XIABIN ; YANG SHIHAO</creator><creatorcontrib>LAI WEISHENG ; GU XIABIN ; YANG SHIHAO</creatorcontrib><description>The invention discloses a monocrystalline silicon-like wafer preparation device, and belongs to the field of crystal production. The preparation device comprises a base, sliding grooves A are formed in the two sides of the center of the base, sliding blocks A are slidably arranged in the sliding grooves A, springs are fixedly arranged in the sliding grooves A and at the outer ends of the sliding blocks A, and clamps are fixedly arranged at the upper ends of the sliding blocks A and penetrate through the sliding grooves A; and side plates are fixedly installed on the outer walls of the upper ends of the left side and the right side of the base, a motor A is fixedly installed at the upper end of the side plate on the left side of the base, the lower end of the motor A penetrates through theside plates and is rotationally provided with a screw A, the outer wall of the screw A is rotationally sleeved with a threaded sleeve A, and limiting rings A are fixedly installed on the upper and lower sides of the threaded</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING ; WORKING CEMENT, CLAY, OR STONE ; WORKING STONE OR STONE-LIKE MATERIALS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210309&DB=EPODOC&CC=CN&NR=112454702A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210309&DB=EPODOC&CC=CN&NR=112454702A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LAI WEISHENG</creatorcontrib><creatorcontrib>GU XIABIN</creatorcontrib><creatorcontrib>YANG SHIHAO</creatorcontrib><title>Monocrystalline-silicon-like wafer preparation device</title><description>The invention discloses a monocrystalline silicon-like wafer preparation device, and belongs to the field of crystal production. The preparation device comprises a base, sliding grooves A are formed in the two sides of the center of the base, sliding blocks A are slidably arranged in the sliding grooves A, springs are fixedly arranged in the sliding grooves A and at the outer ends of the sliding blocks A, and clamps are fixedly arranged at the upper ends of the sliding blocks A and penetrate through the sliding grooves A; and side plates are fixedly installed on the outer walls of the upper ends of the left side and the right side of the base, a motor A is fixedly installed at the upper end of the side plate on the left side of the base, the lower end of the motor A penetrates through theside plates and is rotationally provided with a screw A, the outer wall of the screw A is rotationally sleeved with a threaded sleeve A, and limiting rings A are fixedly installed on the upper and lower sides of the threaded</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><subject>WORKING CEMENT, CLAY, OR STONE</subject><subject>WORKING STONE OR STONE-LIKE MATERIALS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD1zc_LTy6qLC5JzMnJzEvVLc7MyUzOz9PNycxOVShPTEstUigoSi1ILEosyczPU0hJLctMTuVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoaGRiamJuYGRo7GxKgBALx5Lc0</recordid><startdate>20210309</startdate><enddate>20210309</enddate><creator>LAI WEISHENG</creator><creator>GU XIABIN</creator><creator>YANG SHIHAO</creator><scope>EVB</scope></search><sort><creationdate>20210309</creationdate><title>Monocrystalline-silicon-like wafer preparation device</title><author>LAI WEISHENG ; GU XIABIN ; YANG SHIHAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN112454702A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><topic>WORKING CEMENT, CLAY, OR STONE</topic><topic>WORKING STONE OR STONE-LIKE MATERIALS</topic><toplevel>online_resources</toplevel><creatorcontrib>LAI WEISHENG</creatorcontrib><creatorcontrib>GU XIABIN</creatorcontrib><creatorcontrib>YANG SHIHAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LAI WEISHENG</au><au>GU XIABIN</au><au>YANG SHIHAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Monocrystalline-silicon-like wafer preparation device</title><date>2021-03-09</date><risdate>2021</risdate><abstract>The invention discloses a monocrystalline silicon-like wafer preparation device, and belongs to the field of crystal production. The preparation device comprises a base, sliding grooves A are formed in the two sides of the center of the base, sliding blocks A are slidably arranged in the sliding grooves A, springs are fixedly arranged in the sliding grooves A and at the outer ends of the sliding blocks A, and clamps are fixedly arranged at the upper ends of the sliding blocks A and penetrate through the sliding grooves A; and side plates are fixedly installed on the outer walls of the upper ends of the left side and the right side of the base, a motor A is fixedly installed at the upper end of the side plate on the left side of the base, the lower end of the motor A penetrates through theside plates and is rotationally provided with a screw A, the outer wall of the screw A is rotationally sleeved with a threaded sleeve A, and limiting rings A are fixedly installed on the upper and lower sides of the threaded</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN112454702A |
source | esp@cenet |
subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING WORKING CEMENT, CLAY, OR STONE WORKING STONE OR STONE-LIKE MATERIALS |
title | Monocrystalline-silicon-like wafer preparation device |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T05%3A32%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LAI%20WEISHENG&rft.date=2021-03-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN112454702A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |