DEVELOPING DEVICE AND DEVELOPING METHOD

The purpose of the present invention is to prevent the occurrence of numerous defects near the center of a substrate to be developed after a developing process. The developing device (30) that develops a substrate (W) includes: a rotating holding part (120) that holds and rotates the substrate (W);...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KURE SEIICHI, NAITO RYOICHIRO, TOSU HIDENORI, YAMAGUCHI TAKAHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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