DEVELOPING DEVICE AND DEVELOPING METHOD
The purpose of the present invention is to prevent the occurrence of numerous defects near the center of a substrate to be developed after a developing process. The developing device (30) that develops a substrate (W) includes: a rotating holding part (120) that holds and rotates the substrate (W);...
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| creator | KURE SEIICHI NAITO RYOICHIRO TOSU HIDENORI YAMAGUCHI TAKAHIRO |
| description | The purpose of the present invention is to prevent the occurrence of numerous defects near the center of a substrate to be developed after a developing process. The developing device (30) that develops a substrate (W) includes: a rotating holding part (120) that holds and rotates the substrate (W); a dispensing part (132) that dispenses a predetermined liquid for developing the substrate (W) thatis held by the rotating holding part (120); and a neutralizing part (150) that supplies ions which have been ionized by an X-ray to the predetermined liquid dispensed onto the substrate (W) that is held by the rotating holding part (120) to neutralize the predetermined liquid.
目的在于防止在显影处理后的处理对象基板的中央附近产生大量缺陷。对处理对象基板(W)进行显影处理的显影处理装置(30)具有：旋转保持部(120)，其保持处理对象基板(W)并使其旋转；喷出部(132)，其向所述旋转保持部(120)所保持的处理对象基板(W)喷出与所述显影处理相关的预先决定的液体；以及除电部(150)，其向被喷出到所述旋转保持部(120)所保持的处理对象基板(W)的所述预先决定的液体供给被X射线离子化所得到的离子，来对该预先决定的液体进行除电。 |
| format | Patent |
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目的在于防止在显影处理后的处理对象基板的中央附近产生大量缺陷。对处理对象基板(W)进行显影处理的显影处理装置(30)具有：旋转保持部(120)，其保持处理对象基板(W)并使其旋转；喷出部(132)，其向所述旋转保持部(120)所保持的处理对象基板(W)喷出与所述显影处理相关的预先决定的液体；以及除电部(150)，其向被喷出到所述旋转保持部(120)所保持的处理对象基板(W)的所述预先决定的液体供给被X射线离子化所得到的离子，来对该预先决定的液体进行除电。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | DEVELOPING DEVICE AND DEVELOPING METHOD |
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