SWING APPARATUS, METHOD FOR PROCESSING A SUBSTRATE, SWING MODULE FOR RECEIVING A SUBSTRATE FROM A TRANSFER CHAMBER, AND VACUUM PROCESSING SYSTEM

A swing apparatus for moving a substrate relative to one or more deposition sources having a longitudinal axis is described. The swing apparatus includes a support body for holding the substrate; a rotation mechanism coupled to the support body for moving the substrate by an angle around a rotational axis to vary the substrate orientation from a transfer or horizontal orientation to a processing or vertical orientation at a processing area; and a linear motion mechanism coupled to the support body for translating the substrate relative to the longitudinal axis of the deposition source, when the substrate is in the processing orientation. 描述了一种用于使基板相对于具有纵轴的一或多个沉积源移动的摆动设备。所述摆动设备包括：支撑主体，所述支撑主体用于保持所述基板；旋转机构，所述旋转机构耦接至所述支撑主体以使基板围绕旋转轴移动一角度，以将基板取向从传递或水平取向改变为处理区域处的处理或竖直取向；以及线性运动机构，所述线性运动机构耦接至所述支撑主体，以在所述基板处于处理取向时使所述基板相对于所述沉积源的纵轴平移。