Circulating water temperature control device for growing single crystal by VGF method and application
The invention relates to a circulating water temperature control device for growing single crystal by a VGF method and application, which belong to the technical field of semiconductor materials and comprise a single crystal furnace and a circulating water system, the circulating water system compri...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a circulating water temperature control device for growing single crystal by a VGF method and application, which belong to the technical field of semiconductor materials and comprise a single crystal furnace and a circulating water system, the circulating water system comprises a circulating water tank, a main pipeline and a branch pipeline; circulating water sequentiallyflows through the main pipeline and the branch pipeline and reaches the single crystal furnace, and then flows through thesingle crystal furnace and returns to the circulating water tank successivelyvia the branch pipeline and the main pipeline. The single crystal furnace water inlet pipeline is provided with a circulating water flow regulating valve and a temperature control device, the single crystal furnace water outlet pipeline is provided with a temperature measuring device, and the temperature field of the next round can be subjected to micro-amplitude correction according to the crystal growth result of the upp |
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