Wafer photoresist stripping equipment

The invention discloses wafer photoresist stripping equipment structurally comprising a supporting table, a box door, a control panel, a stripping main machine, a warning lamp and an ion box, the stripping main machine is fixedly installed at the upper end of the left side of the supporting table, t...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SHI XUEXIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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