Wafer photoresist stripping equipment

The invention discloses wafer photoresist stripping equipment structurally comprising a supporting table, a box door, a control panel, a stripping main machine, a warning lamp and an ion box, the stripping main machine is fixedly installed at the upper end of the left side of the supporting table, the front end of the stripping main machine is hinged to the box door, a sliding block slides downwards in a sliding rail, and a telescopic guide pipe extends at the moment; a certain rotating force is provided for a rotating plate through the torsion shaft, then ions are sprayed out through the interior of the ion box; meanwhile, the ions are guided and injected through a sealing cover and a guide rod in the ion box, and thus the ions make close contact with the surface of a wafer, and the effect of stripping and removing photoresist on the surface of the wafer is improved. The outer side of the bottom of the wafer abuts against four adsorption mechanisms; according to the size of the diameter of the wafer, the suc