Device and method for detecting and cleaning tiny dust on glass surface and film surface of photomask
The invention relates to a device and a method for detecting and cleaning tiny dust on a glass surface and a film surface of a photomask. The device includes: a loading unit including a holding portion for holding a photomask; a detection unit for detecting tiny dust on the photomask; and a cleaning...
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| creator | HE XIAOBIN LI JUNFENG LIANG XIANSHI WANG WENWU JIN CHENGYU YANG TAO JIN SHUAIJIONG |
| description | The invention relates to a device and a method for detecting and cleaning tiny dust on a glass surface and a film surface of a photomask. The device includes: a loading unit including a holding portion for holding a photomask; a detection unit for detecting tiny dust on the photomask; and a cleaning unit for cleaning the detected tiny dust. When the tiny dust cleaning device is applied, a photomask to be detected can be loaded on the loading unit, the loaded photomask is kept on a keeping part, then the detection unit can be started to detect tiny dust on the photomask, and after detection iscompleted, the tiny dust can be cleaned through the cleaning unit, so that the tiny dust on the photomask is removed. According to tiny dust cleaning device, tiny dust detection and tiny dust cleaningwork can be sequentially carried out on the photomask in a continuous mode, the tiny dust detection work and the tiny dust cleaning work are seamlessly connected, and therefore the overall efficiencyof the tiny dust detection |
| format | Patent |
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The device includes: a loading unit including a holding portion for holding a photomask; a detection unit for detecting tiny dust on the photomask; and a cleaning unit for cleaning the detected tiny dust. When the tiny dust cleaning device is applied, a photomask to be detected can be loaded on the loading unit, the loaded photomask is kept on a keeping part, then the detection unit can be started to detect tiny dust on the photomask, and after detection iscompleted, the tiny dust can be cleaned through the cleaning unit, so that the tiny dust on the photomask is removed. 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| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN112051273A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL TESTING TRANSPORTING |
| title | Device and method for detecting and cleaning tiny dust on glass surface and film surface of photomask |
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