SPATIAL MODULATION OF LIGHT BEAM

A system includes a spatial modulation device configured to interact with a light beam to create a modified light beam, the modified light beam including a spatial pattern of light that has a non-uniform intensity along a direction that is perpendicular to a direction of propagation of the modified light beam. The spatial pattern of light includes one or more components of light; and a target supply system configured to provide a target to a target region, wherein the target includes target material that, when in a plasma state, emits EUV light. The target region overlaps with the beam path such that at least some of the one or more components of light in the modified beam interact with a portion of the target. 一种系统包括空间调制设备，其被配置为与光束相互作用以创建经修改光束，该经修改光束包括沿垂直于该经修改光束的传播方向的方向具有非均一强度的光的空间图案，该光的空间图案包括一个或多个光分量；和目标供应系统，其被配置为向目标区域提供目标，该目标包括目标材料，所述目标材料在处于等离子体状态时发射EUV光。该目标区域与束路径重叠，使得该经修改束中的一个或多个光分量中的至少一些光分量与该目标的一部分进行相互作用。