Substrate processing apparatus

Substrate processing apparatus

A substrate processing apparatus is provided. In the substrate processing apparatus (100), a transport robot (122) which transports a substrate (W) between an indexer part (110) and a substrate processing part (130) is installed in a substrate transport part (120). A transport fan filter unit (126)...

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Hauptverfasser: KIKUMOTO NORIYUKI, YAMADA KUNIO, INOUE KAZUKI, ITO TETSUO
Format: Patent
Sprache:chi ; eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator KIKUMOTO NORIYUKI
YAMADA KUNIO
INOUE KAZUKI
ITO TETSUO
description A substrate processing apparatus is provided. In the substrate processing apparatus (100), a transport robot (122) which transports a substrate (W) between an indexer part (110) and a substrate processing part (130) is installed in a substrate transport part (120). A transport fan filter unit (126) is provided in an upper part of the substrate transport part (120). An exhaust port (124p) is provided in the substrate transport part (120). The circulation piping (142) allows the exhaust port (124p) of the substrate transport part (120) and the transport fan filter unit (126) to communicate witheach other. The exhaust pipe (146) is connected to the circulation piping (142). An inert gas supply part (148) supplies an inert gas to the circulation piping (142). The circulation fan filter unit (144) is disposed downstream of a connecting portion of the circulation piping (142) with the exhaust pipe (146) to be parallel to a flow path of the circulation piping (142). 本发明提供一种基板处理装置。在基板处理装置(100)中，在基板搬送部(120)，设置在索引部(110
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Substrate processing apparatus
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