CLEANING NOZZLE AND METHOD OF CLEANING OBJECT TO BE CLEANED
The invention provides a cleaning nozzle and a method of cleaning an object to be cleaned, which can violently discharge a cleaning liquid with a simple structure. A cleaning unit that washes leftovermaterials (106) obtained by cutting, said cleaning unit being provided with: a cleaning water supply...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KATOH KEI UEYAMA HIROMITSU |
| description | The invention provides a cleaning nozzle and a method of cleaning an object to be cleaned, which can violently discharge a cleaning liquid with a simple structure. A cleaning unit that washes leftovermaterials (106) obtained by cutting, said cleaning unit being provided with: a cleaning water supply path (43) that connects a cleaning water supply source (200) and a cleaning nozzle (42); an air supply path (45) for communicating the air supply source (201) with the cleaning nozzle (42); an air valve (46) for opening and closing the air supply passage (45); and a control means (60) for intermittently controlling the air valve (46).
提供清洗喷嘴以及被清洗物的清洗方法，能够以简单的构造猛烈地喷出清洗液。一种清洗单元，其将切削得到的边角料(106)冲走而进行清洗，其中，该清洗单元具有：清洗水提供路(43)，其将清洗水提供源(200)与清洗喷嘴(42)连通；空气提供路(45)，其将空气提供源(201)与清洗喷嘴(42)连通；空气阀(46)，其对空气提供路(45)进行开闭；以及控制单元(60)，其间歇地对空气阀(46)进行。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN111530649A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN111530649A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN111530649A3</originalsourceid><addsrcrecordid>eNrjZLB29nF19PP0c1fw84-K8nFVcPRzUfB1DfHwd1Hwd1OAy_o7ebk6hyiE-Cs4uUJEXV14GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hoaGpsYGZiaWjMTFqAJPIKJg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CLEANING NOZZLE AND METHOD OF CLEANING OBJECT TO BE CLEANED</title><source>esp@cenet</source><creator>KATOH KEI ; UEYAMA HIROMITSU</creator><creatorcontrib>KATOH KEI ; UEYAMA HIROMITSU</creatorcontrib><description>The invention provides a cleaning nozzle and a method of cleaning an object to be cleaned, which can violently discharge a cleaning liquid with a simple structure. A cleaning unit that washes leftovermaterials (106) obtained by cutting, said cleaning unit being provided with: a cleaning water supply path (43) that connects a cleaning water supply source (200) and a cleaning nozzle (42); an air supply path (45) for communicating the air supply source (201) with the cleaning nozzle (42); an air valve (46) for opening and closing the air supply passage (45); and a control means (60) for intermittently controlling the air valve (46).
提供清洗喷嘴以及被清洗物的清洗方法，能够以简单的构造猛烈地喷出清洗液。一种清洗单元，其将切削得到的边角料(106)冲走而进行清洗，其中，该清洗单元具有：清洗水提供路(43)，其将清洗水提供源(200)与清洗喷嘴(42)连通；空气提供路(45)，其将空气提供源(201)与清洗喷嘴(42)连通；空气阀(46)，其对空气提供路(45)进行开闭；以及控制单元(60)，其间歇地对空气阀(46)进行。</description><language>chi ; eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; BASIC ELECTRIC ELEMENTS ; CLEANING ; CLEANING IN GENERAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; NOZZLES ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200814&DB=EPODOC&CC=CN&NR=111530649A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200814&DB=EPODOC&CC=CN&NR=111530649A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KATOH KEI</creatorcontrib><creatorcontrib>UEYAMA HIROMITSU</creatorcontrib><title>CLEANING NOZZLE AND METHOD OF CLEANING OBJECT TO BE CLEANED</title><description>The invention provides a cleaning nozzle and a method of cleaning an object to be cleaned, which can violently discharge a cleaning liquid with a simple structure. A cleaning unit that washes leftovermaterials (106) obtained by cutting, said cleaning unit being provided with: a cleaning water supply path (43) that connects a cleaning water supply source (200) and a cleaning nozzle (42); an air supply path (45) for communicating the air supply source (201) with the cleaning nozzle (42); an air valve (46) for opening and closing the air supply passage (45); and a control means (60) for intermittently controlling the air valve (46).
提供清洗喷嘴以及被清洗物的清洗方法，能够以简单的构造猛烈地喷出清洗液。一种清洗单元，其将切削得到的边角料(106)冲走而进行清洗，其中，该清洗单元具有：清洗水提供路(43)，其将清洗水提供源(200)与清洗喷嘴(42)连通；空气提供路(45)，其将空气提供源(201)与清洗喷嘴(42)连通；空气阀(46)，其对空气提供路(45)进行开闭；以及控制单元(60)，其间歇地对空气阀(46)进行。</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>NOZZLES</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB29nF19PP0c1fw84-K8nFVcPRzUfB1DfHwd1Hwd1OAy_o7ebk6hyiE-Cs4uUJEXV14GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hoaGpsYGZiaWjMTFqAJPIKJg</recordid><startdate>20200814</startdate><enddate>20200814</enddate><creator>KATOH KEI</creator><creator>UEYAMA HIROMITSU</creator><scope>EVB</scope></search><sort><creationdate>20200814</creationdate><title>CLEANING NOZZLE AND METHOD OF CLEANING OBJECT TO BE CLEANED</title><author>KATOH KEI ; UEYAMA HIROMITSU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN111530649A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>NOZZLES</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KATOH KEI</creatorcontrib><creatorcontrib>UEYAMA HIROMITSU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KATOH KEI</au><au>UEYAMA HIROMITSU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CLEANING NOZZLE AND METHOD OF CLEANING OBJECT TO BE CLEANED</title><date>2020-08-14</date><risdate>2020</risdate><abstract>The invention provides a cleaning nozzle and a method of cleaning an object to be cleaned, which can violently discharge a cleaning liquid with a simple structure. A cleaning unit that washes leftovermaterials (106) obtained by cutting, said cleaning unit being provided with: a cleaning water supply path (43) that connects a cleaning water supply source (200) and a cleaning nozzle (42); an air supply path (45) for communicating the air supply source (201) with the cleaning nozzle (42); an air valve (46) for opening and closing the air supply passage (45); and a control means (60) for intermittently controlling the air valve (46).
提供清洗喷嘴以及被清洗物的清洗方法，能够以简单的构造猛烈地喷出清洗液。一种清洗单元，其将切削得到的边角料(106)冲走而进行清洗，其中，该清洗单元具有：清洗水提供路(43)，其将清洗水提供源(200)与清洗喷嘴(42)连通；空气提供路(45)，其将空气提供源(201)与清洗喷嘴(42)连通；空气阀(46)，其对空气提供路(45)进行开闭；以及控制单元(60)，其间歇地对空气阀(46)进行。</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN111530649A |
| source | esp@cenet |
| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | CLEANING NOZZLE AND METHOD OF CLEANING OBJECT TO BE CLEANED |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T13%3A24%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KATOH%20KEI&rft.date=2020-08-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN111530649A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |