Nitrogen-doped CVD diamond laser crystal and preparation method thereof

The invention relates to the technical field of laser science. The invention further discloses a nitrogen-doped CVD diamond laser crystal. The nitrogen-doped CVD diamond laser crystal comprises a CVDdiamond crystal, an antireflection film and a reflecting film, and the antireflection film is plated...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LIU HONGMING, ZHAO FENXIA
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator LIU HONGMING
ZHAO FENXIA
description The invention relates to the technical field of laser science. The invention further discloses a nitrogen-doped CVD diamond laser crystal. The nitrogen-doped CVD diamond laser crystal comprises a CVDdiamond crystal, an antireflection film and a reflecting film, and the antireflection film is plated on the front surface of the CVD diamond crystal; the reflecting film is plated on the rear surfaceof the CVD diamond crystal; the antireflection film is formed by superposing a magnesium fluoride film, a hafnium dioxide film and a titanium dioxide film, and the reflecting film comprises the following components in parts by mass: 30-40 parts of titanium dioxide powder, 5-8 parts of aluminum oxide powder, 30-35 parts of optical epoxy resin glue, 2-3 parts of a brightening agent and 8-12 parts ofan auxiliary agent; the reflecting film is prepared by adopting the following method: adding titanium dioxide powder and aluminum oxide powder with corresponding weights into a stirring tank for mixing at a stirring speed of 8
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN111411397A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN111411397A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN111411397A3</originalsourceid><addsrcrecordid>eNqNyr0KwjAUhuEsDqLew_ECOoQK4iipP1MncS2H5qsNpDnhJIt3r4MX4PTCw7s2tz5UlRdS4yXDk3t25AMvkjxFLlAa9V0qR-KvZEVm5Rok0YI6i6c6QyHT1qwmjgW7Xzdmf7083L1BlgEl84iEOrjeWnuwtj0dz-0_zwdH1jO9</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Nitrogen-doped CVD diamond laser crystal and preparation method thereof</title><source>esp@cenet</source><creator>LIU HONGMING ; ZHAO FENXIA</creator><creatorcontrib>LIU HONGMING ; ZHAO FENXIA</creatorcontrib><description>The invention relates to the technical field of laser science. The invention further discloses a nitrogen-doped CVD diamond laser crystal. The nitrogen-doped CVD diamond laser crystal comprises a CVDdiamond crystal, an antireflection film and a reflecting film, and the antireflection film is plated on the front surface of the CVD diamond crystal; the reflecting film is plated on the rear surfaceof the CVD diamond crystal; the antireflection film is formed by superposing a magnesium fluoride film, a hafnium dioxide film and a titanium dioxide film, and the reflecting film comprises the following components in parts by mass: 30-40 parts of titanium dioxide powder, 5-8 parts of aluminum oxide powder, 30-35 parts of optical epoxy resin glue, 2-3 parts of a brightening agent and 8-12 parts ofan auxiliary agent; the reflecting film is prepared by adopting the following method: adding titanium dioxide powder and aluminum oxide powder with corresponding weights into a stirring tank for mixing at a stirring speed of 8</description><language>chi ; eng</language><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE ; APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CRYSTAL GROWTH ; DEVICES USING STIMULATED EMISSION ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; REFINING BY ZONE-MELTING OF MATERIAL ; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; SINGLE-CRYSTAL-GROWTH ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200714&amp;DB=EPODOC&amp;CC=CN&amp;NR=111411397A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200714&amp;DB=EPODOC&amp;CC=CN&amp;NR=111411397A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU HONGMING</creatorcontrib><creatorcontrib>ZHAO FENXIA</creatorcontrib><title>Nitrogen-doped CVD diamond laser crystal and preparation method thereof</title><description>The invention relates to the technical field of laser science. The invention further discloses a nitrogen-doped CVD diamond laser crystal. The nitrogen-doped CVD diamond laser crystal comprises a CVDdiamond crystal, an antireflection film and a reflecting film, and the antireflection film is plated on the front surface of the CVD diamond crystal; the reflecting film is plated on the rear surfaceof the CVD diamond crystal; the antireflection film is formed by superposing a magnesium fluoride film, a hafnium dioxide film and a titanium dioxide film, and the reflecting film comprises the following components in parts by mass: 30-40 parts of titanium dioxide powder, 5-8 parts of aluminum oxide powder, 30-35 parts of optical epoxy resin glue, 2-3 parts of a brightening agent and 8-12 parts ofan auxiliary agent; the reflecting film is prepared by adopting the following method: adding titanium dioxide powder and aluminum oxide powder with corresponding weights into a stirring tank for mixing at a stirring speed of 8</description><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</subject><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CRYSTAL GROWTH</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>REFINING BY ZONE-MELTING OF MATERIAL</subject><subject>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>SINGLE-CRYSTAL-GROWTH</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyr0KwjAUhuEsDqLew_ECOoQK4iipP1MncS2H5qsNpDnhJIt3r4MX4PTCw7s2tz5UlRdS4yXDk3t25AMvkjxFLlAa9V0qR-KvZEVm5Rok0YI6i6c6QyHT1qwmjgW7Xzdmf7083L1BlgEl84iEOrjeWnuwtj0dz-0_zwdH1jO9</recordid><startdate>20200714</startdate><enddate>20200714</enddate><creator>LIU HONGMING</creator><creator>ZHAO FENXIA</creator><scope>EVB</scope></search><sort><creationdate>20200714</creationdate><title>Nitrogen-doped CVD diamond laser crystal and preparation method thereof</title><author>LIU HONGMING ; ZHAO FENXIA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN111411397A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</topic><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CRYSTAL GROWTH</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>REFINING BY ZONE-MELTING OF MATERIAL</topic><topic>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>SINGLE-CRYSTAL-GROWTH</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</topic><toplevel>online_resources</toplevel><creatorcontrib>LIU HONGMING</creatorcontrib><creatorcontrib>ZHAO FENXIA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIU HONGMING</au><au>ZHAO FENXIA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Nitrogen-doped CVD diamond laser crystal and preparation method thereof</title><date>2020-07-14</date><risdate>2020</risdate><abstract>The invention relates to the technical field of laser science. The invention further discloses a nitrogen-doped CVD diamond laser crystal. The nitrogen-doped CVD diamond laser crystal comprises a CVDdiamond crystal, an antireflection film and a reflecting film, and the antireflection film is plated on the front surface of the CVD diamond crystal; the reflecting film is plated on the rear surfaceof the CVD diamond crystal; the antireflection film is formed by superposing a magnesium fluoride film, a hafnium dioxide film and a titanium dioxide film, and the reflecting film comprises the following components in parts by mass: 30-40 parts of titanium dioxide powder, 5-8 parts of aluminum oxide powder, 30-35 parts of optical epoxy resin glue, 2-3 parts of a brightening agent and 8-12 parts ofan auxiliary agent; the reflecting film is prepared by adopting the following method: adding titanium dioxide powder and aluminum oxide powder with corresponding weights into a stirring tank for mixing at a stirring speed of 8</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN111411397A
source esp@cenet
subjects AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
CRYSTAL GROWTH
DEVICES USING STIMULATED EMISSION
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
REFINING BY ZONE-MELTING OF MATERIAL
SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
SINGLE-CRYSTAL-GROWTH
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
title Nitrogen-doped CVD diamond laser crystal and preparation method thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T17%3A33%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LIU%20HONGMING&rft.date=2020-07-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN111411397A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true