Dielectric barrier low-temperature plasma discharge assembly
The invention relates to a dielectric barrier low-temperature plasma discharge assembly, which comprises a barrier dielectric tube, a grounding electrode and a discharge electrode. The grounding electrode is wound on the outer side wall of the barrier dielectric tube, two ends of the grounding elect...
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| creator | YAN KEPING WANG TAO YANG LEI GE JIELONG LEI SHUANGJIAN |
| description | The invention relates to a dielectric barrier low-temperature plasma discharge assembly, which comprises a barrier dielectric tube, a grounding electrode and a discharge electrode. The grounding electrode is wound on the outer side wall of the barrier dielectric tube, two ends of the grounding electrode form a fixed ring connected with a reactor body, and the discharge electrode is arranged in thebarrier dielectric tube. The dielectric barrier low-temperature plasma discharge assembly has the advantages that the dielectric barrier tube is fixed to the reactor shell through the grounding electrode wound on the barrier dielectric tube to form grounding; then, power is supplied to the discharge electrode in the barrier dielectric tube to generate fluidization discharge to form plasma; the discharge electrode is arranged in the barrier dielectric tube; therefore, dielectric barrier discharge is formed in the discharge process, and the discharge is uniform and stable, so that the dischargeassembly can be used for |
| format | Patent |
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The grounding electrode is wound on the outer side wall of the barrier dielectric tube, two ends of the grounding electrode form a fixed ring connected with a reactor body, and the discharge electrode is arranged in thebarrier dielectric tube. The dielectric barrier low-temperature plasma discharge assembly has the advantages that the dielectric barrier tube is fixed to the reactor shell through the grounding electrode wound on the barrier dielectric tube to form grounding; then, power is supplied to the discharge electrode in the barrier dielectric tube to generate fluidization discharge to form plasma; the discharge electrode is arranged in the barrier dielectric tube; therefore, dielectric barrier discharge is formed in the discharge process, and the discharge is uniform and stable, so that the dischargeassembly can be used for</description><language>chi ; eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SEPARATION ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200703&DB=EPODOC&CC=CN&NR=111359394A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200703&DB=EPODOC&CC=CN&NR=111359394A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAN KEPING</creatorcontrib><creatorcontrib>WANG TAO</creatorcontrib><creatorcontrib>YANG LEI</creatorcontrib><creatorcontrib>GE JIELONG</creatorcontrib><creatorcontrib>LEI SHUANGJIAN</creatorcontrib><title>Dielectric barrier low-temperature plasma discharge assembly</title><description>The invention relates to a dielectric barrier low-temperature plasma discharge assembly, which comprises a barrier dielectric tube, a grounding electrode and a discharge electrode. 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The grounding electrode is wound on the outer side wall of the barrier dielectric tube, two ends of the grounding electrode form a fixed ring connected with a reactor body, and the discharge electrode is arranged in thebarrier dielectric tube. The dielectric barrier low-temperature plasma discharge assembly has the advantages that the dielectric barrier tube is fixed to the reactor shell through the grounding electrode wound on the barrier dielectric tube to form grounding; then, power is supplied to the discharge electrode in the barrier dielectric tube to generate fluidization discharge to form plasma; the discharge electrode is arranged in the barrier dielectric tube; therefore, dielectric barrier discharge is formed in the discharge process, and the discharge is uniform and stable, so that the dischargeassembly can be used for</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEPARATION TRANSPORTING |
| title | Dielectric barrier low-temperature plasma discharge assembly |
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