Alignment system
The instant disclosure includes an alignment system. The alignment system includes a first set of alignment marks, a second set of alignment marks, and a third set of alignment marks. The first, second and third alignment marks correspondingly includes a plurality of segments separated into groups....
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| creator | YANG SIWON KWON BYUNG-IN YOO JIYONG |
| description | The instant disclosure includes an alignment system. The alignment system includes a first set of alignment marks, a second set of alignment marks, and a third set of alignment marks. The first, second and third alignment marks correspondingly includes a plurality of segments separated into groups. Each of the group is symmetric to a respective other group. The third set of alignment marks is diagonal to the first set of alignment marks and the second set of alignment marks.
本发明公开了一种对准标记系统，其包括：第一组对准标记，其具有被分成群组的多个段，所述组彼此对称；与所述第一组对准标记正交的第二组对准标记，所述第二组对准标记具有被分成群组的多个段，各组彼此对称；和一与所述第一组对准标记和所述第二组对准标记对角设置的第三组对准标记，所述第三组对准标记具有被分成群组的多个段，并且所述群组正交于其各自的相邻组。 |
| format | Patent |
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本发明公开了一种对准标记系统，其包括：第一组对准标记，其具有被分成群组的多个段，所述组彼此对称；与所述第一组对准标记正交的第二组对准标记，所述第二组对准标记具有被分成群组的多个段，各组彼此对称；和一与所述第一组对准标记和所述第二组对准标记对角设置的第三组对准标记，所述第三组对准标记具有被分成群组的多个段，并且所述群组正交于其各自的相邻组。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200630&DB=EPODOC&CC=CN&NR=111354714A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200630&DB=EPODOC&CC=CN&NR=111354714A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG SIWON</creatorcontrib><creatorcontrib>KWON BYUNG-IN</creatorcontrib><creatorcontrib>YOO JIYONG</creatorcontrib><title>Alignment system</title><description>The instant disclosure includes an alignment system. The alignment system includes a first set of alignment marks, a second set of alignment marks, and a third set of alignment marks. The first, second and third alignment marks correspondingly includes a plurality of segments separated into groups. Each of the group is symmetric to a respective other group. The third set of alignment marks is diagonal to the first set of alignment marks and the second set of alignment marks.
本发明公开了一种对准标记系统，其包括：第一组对准标记，其具有被分成群组的多个段，所述组彼此对称；与所述第一组对准标记正交的第二组对准标记，所述第二组对准标记具有被分成群组的多个段，各组彼此对称；和一与所述第一组对准标记和所述第二组对准标记对角设置的第三组对准标记，所述第三组对准标记具有被分成群组的多个段，并且所述群组正交于其各自的相邻组。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBBwzMlMz8tNzStRKK4sLknN5WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hoaGxqYm5oYmjsbEqAEAtDQfUQ</recordid><startdate>20200630</startdate><enddate>20200630</enddate><creator>YANG SIWON</creator><creator>KWON BYUNG-IN</creator><creator>YOO JIYONG</creator><scope>EVB</scope></search><sort><creationdate>20200630</creationdate><title>Alignment system</title><author>YANG SIWON ; KWON BYUNG-IN ; YOO JIYONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN111354714A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG SIWON</creatorcontrib><creatorcontrib>KWON BYUNG-IN</creatorcontrib><creatorcontrib>YOO JIYONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG SIWON</au><au>KWON BYUNG-IN</au><au>YOO JIYONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Alignment system</title><date>2020-06-30</date><risdate>2020</risdate><abstract>The instant disclosure includes an alignment system. The alignment system includes a first set of alignment marks, a second set of alignment marks, and a third set of alignment marks. The first, second and third alignment marks correspondingly includes a plurality of segments separated into groups. Each of the group is symmetric to a respective other group. The third set of alignment marks is diagonal to the first set of alignment marks and the second set of alignment marks.
本发明公开了一种对准标记系统，其包括：第一组对准标记，其具有被分成群组的多个段，所述组彼此对称；与所述第一组对准标记正交的第二组对准标记，所述第二组对准标记具有被分成群组的多个段，各组彼此对称；和一与所述第一组对准标记和所述第二组对准标记对角设置的第三组对准标记，所述第三组对准标记具有被分成群组的多个段，并且所述群组正交于其各自的相邻组。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Alignment system |
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