Semiconductor device preparation method

The invention relates to a semiconductor device preparation method, which comprises the steps of providing a semiconductor substrate comprising a primitive cell region and a non-primitive cell region,and sequentially forming an isolation dielectric layer and a semiconductor layer with first conducti...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	LIAO YUANBAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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