High-concentration CF developing solution composition used in field of display panels
The invention belongs to the technical field of surfactants, and particularly relates to a chemical preparation in the field of display panels, which is used for developing negative photoresist in a CF (Color Filter) process of liquid crystal display. The composition is prepared from 5 to 30 percent...
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| creator | YAN RUCAI TIAN BO LIU XIAOYONG |
| description | The invention belongs to the technical field of surfactants, and particularly relates to a chemical preparation in the field of display panels, which is used for developing negative photoresist in a CF (Color Filter) process of liquid crystal display. The composition is prepared from 5 to 30 percent of nonionic surfactant A, 5 to 15 percent of nonionic surfactant B, 5 to 15 percent of inorganic strong base and 45 to 85 percent of high-purity water. The concentration of the high-concentration CF developing solution composition is 2-4 times that of a general product on the market at present. Thenonionic surfactant A and the nonionic surfactant B are mixed to form a microemulsion, and the stability of the system is maintained together. The use condition of the developing solution is that thedeveloping solution is used after being diluted by 100-400 times with water, and the characteristics of low foam, clear developed patterns, no residue, no substrate corrosion, stable dispersion of photoresist residues after d |
| format | Patent |
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The composition is prepared from 5 to 30 percent of nonionic surfactant A, 5 to 15 percent of nonionic surfactant B, 5 to 15 percent of inorganic strong base and 45 to 85 percent of high-purity water. The concentration of the high-concentration CF developing solution composition is 2-4 times that of a general product on the market at present. Thenonionic surfactant A and the nonionic surfactant B are mixed to form a microemulsion, and the stability of the system is maintained together. 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The composition is prepared from 5 to 30 percent of nonionic surfactant A, 5 to 15 percent of nonionic surfactant B, 5 to 15 percent of inorganic strong base and 45 to 85 percent of high-purity water. The concentration of the high-concentration CF developing solution composition is 2-4 times that of a general product on the market at present. Thenonionic surfactant A and the nonionic surfactant B are mixed to form a microemulsion, and the stability of the system is maintained together. The use condition of the developing solution is that thedeveloping solution is used after being diluted by 100-400 times with water, and the characteristics of low foam, clear developed patterns, no residue, no substrate corrosion, stable dispersion of photoresist residues after d</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | High-concentration CF developing solution composition used in field of display panels |
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