Method for compensating an exposure error in an exposure process

A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of adose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calcu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CASTELIJNS HENRICUS JOZEF, LEVASIER LEON MARTIN, BECKERS MARCEL, BERENDSEN CHRISTIANUS WILHELMUS JOHANNES, GERAETS HUBERTUS ANTONIUS, TROMP SIEGFRIED ALEXANDER, KOEVOETS ADRIANUS HENDRIK, SCHAAP PETER, STREEFKERK BOB
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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