Substrate retaining apparatus, system including the apparatus, and method of using same

A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least on...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WILSON JR JAMES KING, KIM SAM, ROBINSON JEFFREY BARRETT, SONJE NINAD VIJAY, RAJAVELU MURALIDHAR SHIVA K. T
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator WILSON JR JAMES KING
KIM SAM
ROBINSON JEFFREY BARRETT
SONJE NINAD VIJAY
RAJAVELU MURALIDHAR SHIVA K. T
description A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least one sidewall can include a cooling fluid conduit to facilitate cooling of substrates retained by the substrate retaining apparatus. Additionally or alternatively, one or more of the at least one sidewall can include a gas conduit to provide gas to a surface of a retained substrate. 公开了衬底保持设备、包括所述衬底保持设备的负载锁组件,以及包含所述衬底保持设备的系统。所述衬底保持设备可包含至少一个侧壁和一个或多个热屏蔽件。所述至少一个侧壁中的一个或多个可包含冷却流体管道,以促进由所述衬底保持设备保持的衬底的冷却。另外或替代地,所述至少一个侧壁中的一个或多个可包含气体管道以将气体提供到所保持衬底的表面。
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN110970344A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN110970344A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN110970344A3</originalsourceid><addsrcrecordid>eNrjZAgPLk0qLilKLElVKEotSczMy8xLV0gsKEgECpUW6ygUVxaXpOYqZOYl55SmgORKMlKR5RPzUhRyU0sy8lMU8tMUSotBSooTc1N5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hoYGluYGxiYmjMTFqAInoOgg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate retaining apparatus, system including the apparatus, and method of using same</title><source>esp@cenet</source><creator>WILSON JR JAMES KING ; KIM SAM ; ROBINSON JEFFREY BARRETT ; SONJE NINAD VIJAY ; RAJAVELU MURALIDHAR SHIVA K. T</creator><creatorcontrib>WILSON JR JAMES KING ; KIM SAM ; ROBINSON JEFFREY BARRETT ; SONJE NINAD VIJAY ; RAJAVELU MURALIDHAR SHIVA K. T</creatorcontrib><description>A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least one sidewall can include a cooling fluid conduit to facilitate cooling of substrates retained by the substrate retaining apparatus. Additionally or alternatively, one or more of the at least one sidewall can include a gas conduit to provide gas to a surface of a retained substrate. 公开了衬底保持设备、包括所述衬底保持设备的负载锁组件,以及包含所述衬底保持设备的系统。所述衬底保持设备可包含至少一个侧壁和一个或多个热屏蔽件。所述至少一个侧壁中的一个或多个可包含冷却流体管道,以促进由所述衬底保持设备保持的衬底的冷却。另外或替代地,所述至少一个侧壁中的一个或多个可包含气体管道以将气体提供到所保持衬底的表面。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200407&amp;DB=EPODOC&amp;CC=CN&amp;NR=110970344A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200407&amp;DB=EPODOC&amp;CC=CN&amp;NR=110970344A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WILSON JR JAMES KING</creatorcontrib><creatorcontrib>KIM SAM</creatorcontrib><creatorcontrib>ROBINSON JEFFREY BARRETT</creatorcontrib><creatorcontrib>SONJE NINAD VIJAY</creatorcontrib><creatorcontrib>RAJAVELU MURALIDHAR SHIVA K. T</creatorcontrib><title>Substrate retaining apparatus, system including the apparatus, and method of using same</title><description>A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least one sidewall can include a cooling fluid conduit to facilitate cooling of substrates retained by the substrate retaining apparatus. Additionally or alternatively, one or more of the at least one sidewall can include a gas conduit to provide gas to a surface of a retained substrate. 公开了衬底保持设备、包括所述衬底保持设备的负载锁组件,以及包含所述衬底保持设备的系统。所述衬底保持设备可包含至少一个侧壁和一个或多个热屏蔽件。所述至少一个侧壁中的一个或多个可包含冷却流体管道,以促进由所述衬底保持设备保持的衬底的冷却。另外或替代地,所述至少一个侧壁中的一个或多个可包含气体管道以将气体提供到所保持衬底的表面。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgPLk0qLilKLElVKEotSczMy8xLV0gsKEgECpUW6ygUVxaXpOYqZOYl55SmgORKMlKR5RPzUhRyU0sy8lMU8tMUSotBSooTc1N5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hoYGluYGxiYmjMTFqAInoOgg</recordid><startdate>20200407</startdate><enddate>20200407</enddate><creator>WILSON JR JAMES KING</creator><creator>KIM SAM</creator><creator>ROBINSON JEFFREY BARRETT</creator><creator>SONJE NINAD VIJAY</creator><creator>RAJAVELU MURALIDHAR SHIVA K. T</creator><scope>EVB</scope></search><sort><creationdate>20200407</creationdate><title>Substrate retaining apparatus, system including the apparatus, and method of using same</title><author>WILSON JR JAMES KING ; KIM SAM ; ROBINSON JEFFREY BARRETT ; SONJE NINAD VIJAY ; RAJAVELU MURALIDHAR SHIVA K. T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN110970344A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>WILSON JR JAMES KING</creatorcontrib><creatorcontrib>KIM SAM</creatorcontrib><creatorcontrib>ROBINSON JEFFREY BARRETT</creatorcontrib><creatorcontrib>SONJE NINAD VIJAY</creatorcontrib><creatorcontrib>RAJAVELU MURALIDHAR SHIVA K. T</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WILSON JR JAMES KING</au><au>KIM SAM</au><au>ROBINSON JEFFREY BARRETT</au><au>SONJE NINAD VIJAY</au><au>RAJAVELU MURALIDHAR SHIVA K. T</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate retaining apparatus, system including the apparatus, and method of using same</title><date>2020-04-07</date><risdate>2020</risdate><abstract>A substrate retaining apparatus, a load lock assembly comprising the substrate retaining apparatus, and a system including the substrate retaining apparatus are disclosed. The substrate retaining apparatus can include at least one sidewall and one or more heat shields. One or more of the at least one sidewall can include a cooling fluid conduit to facilitate cooling of substrates retained by the substrate retaining apparatus. Additionally or alternatively, one or more of the at least one sidewall can include a gas conduit to provide gas to a surface of a retained substrate. 公开了衬底保持设备、包括所述衬底保持设备的负载锁组件,以及包含所述衬底保持设备的系统。所述衬底保持设备可包含至少一个侧壁和一个或多个热屏蔽件。所述至少一个侧壁中的一个或多个可包含冷却流体管道,以促进由所述衬底保持设备保持的衬底的冷却。另外或替代地,所述至少一个侧壁中的一个或多个可包含气体管道以将气体提供到所保持衬底的表面。</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN110970344A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Substrate retaining apparatus, system including the apparatus, and method of using same
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T14%3A11%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WILSON%20JR%20JAMES%20KING&rft.date=2020-04-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN110970344A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true