METHOD OF GENERATING A TRAINING SET USABLE FOR EXAMINATION OF A SEMICONDUCTOR SPECIMEN AND SYSTEM THEREOF
There is provided a method of examination of a semiconductor specimen. The method comprises: upon obtaining by a computer a Deep Neural Network (DNN) trained for a given examination-related application within a semiconductor fabrication process, processing together one or more fabrication process (F...
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Zusammenfassung: | There is provided a method of examination of a semiconductor specimen. The method comprises: upon obtaining by a computer a Deep Neural Network (DNN) trained for a given examination-related application within a semiconductor fabrication process, processing together one or more fabrication process (FP) images using the obtained trained DNN, wherein the DNN is trained using a training set comprisingsynthetic images specific for the given application; and obtaining, by the computer, examination-related data specific for the given application, and characterizing at least one of the processed oneor more FP images. Generating the training set can comprise: training an auxiliary DNN to generate a latent space, generating a synthetic image by applying the trained auxiliary DNN to a point selected in the generated latent space, and adding the generated synthetic image to the training set.
提供了一种检查半导体样品的方法。该方法包括:在由计算机获得在半导体制造过程中针对给定的检查相关应用而训练的深度神经网络(DNN)时,使用获得的经训练的DNN一起处理一个或多个制造过程(FP)图像,其中使用包含特定于给定应用程序的合成图像的训练集来训练该DNN;和 |
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