Lithographic apparatus, method of transferring substrate and device manufacturing method

A lithographic apparatus comprises a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for anexposure process. The post-exposure handling module is for handling the substrate post-exposure. The...

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Bibliographische Detailangaben

Hauptverfasser:	OLIESLAGERS RUUD, ROPS CORNELIUS MARIA, PIETERSE GERBEN, VAN DEN EIJNDEN PEPIJN, ALBERTI JOZEF AUGUSTINUS MARIA, SEGERS HUBERT MARIE, WILLEMS BAS, FAHRNI FRANCIS, VAN DONGEN PAUL, VAN BEUZEKOM AART ADRIANUS, VAN DER HAM RONALD
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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