TARGET FOR OBTAINING COLOURED GLAZING

Sputtering cathode target consisting on the one hand of an oxide of at least one element selected from the group consisting of titanium, silicon, zirconium and, on the other hand, particles of a metalselected from the group consisting of silver, gold, platinum, copper and nickel or particles of an a...

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Bibliographische Detailangaben
Hauptverfasser: MAGDENKO-SAVOUREY LIUBOV, MATEUS CRISALIA, BILLIERES DOMINIQUE, MARLIN SAMUEL
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Sputtering cathode target consisting on the one hand of an oxide of at least one element selected from the group consisting of titanium, silicon, zirconium and, on the other hand, particles of a metalselected from the group consisting of silver, gold, platinum, copper and nickel or particles of an alloy consisting of at least two of these metals, the atomic ratio M/Me in said target being less than 1.5, M representing all the atoms of the elements of said group of titanium, silicon, zirconium present and Me representing all the atoms of the metals of the group consisting of silver, gold, platinum, copper and nickel present. 一种阴极溅射靶,其由一方面选自由钛、硅和锆构成的组中的至少一种元素的氧化物和另一方面在由银、金、铂、铜和镍构成的组中包括的金属的颗粒或由这些金属中的至少两种形成的合金的颗粒构成,在所述靶中的M/Me原子比小于1.5,其中M代表钛、硅、锆的组中的元素的所有原子和Me代表由银、金、铂、铜和镍构成的组中的金属的所有原子。