Preparation method of molybdenum plane sputtering target material
The invention discloses a preparation method of a molybdenum plane sputtering target material, and relates to the technical field of sputtering target material preparation. Molybdenum powder with thepurity of more than or equal to 99% is selected as a raw material, molybdenum powder is pressed into...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | XIE JINGPEI MAO AIXIA MA DOUQIN CHEN YANFANG CHANG QINGHUA MAO ZHIPING ZHAO HAILI YANG BIN LIU PEI |
| description | The invention discloses a preparation method of a molybdenum plane sputtering target material, and relates to the technical field of sputtering target material preparation. Molybdenum powder with thepurity of more than or equal to 99% is selected as a raw material, molybdenum powder is pressed into a molybdenum green body through cold isostatic pressing, and then the molybdenum green body is sintered into a molybdenum plate blank in a microwave sintering furnace under a vacuum condition; and the sintered molybdenum plate blank is purified using an electron beam melting method, a molybdenum target material is processed by adopting a processing mode of cross rolling after hammer cogging, and the molybdenum target material is machined into a finished molybdenum sputtering target material according to a specified specification after vacuum annealing. The preparation method of the molybdenum plane sputtering target material has the beneficial effects that the prepared molybdenum sputteringtarget material is high i |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN110777343A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN110777343A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN110777343A3</originalsourceid><addsrcrecordid>eNrjZHAMKEotSCxKLMnMz1PITS3JyE9RyE9TyM3PqUxKSc0rzVUoyEnMS1UoLigtKUktysxLVyhJLEpPLVHITQTxE3N4GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hoYG5ubmxibGjMTFqAFcIMlw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Preparation method of molybdenum plane sputtering target material</title><source>esp@cenet</source><creator>XIE JINGPEI ; MAO AIXIA ; MA DOUQIN ; CHEN YANFANG ; CHANG QINGHUA ; MAO ZHIPING ; ZHAO HAILI ; YANG BIN ; LIU PEI</creator><creatorcontrib>XIE JINGPEI ; MAO AIXIA ; MA DOUQIN ; CHEN YANFANG ; CHANG QINGHUA ; MAO ZHIPING ; ZHAO HAILI ; YANG BIN ; LIU PEI</creatorcontrib><description>The invention discloses a preparation method of a molybdenum plane sputtering target material, and relates to the technical field of sputtering target material preparation. Molybdenum powder with thepurity of more than or equal to 99% is selected as a raw material, molybdenum powder is pressed into a molybdenum green body through cold isostatic pressing, and then the molybdenum green body is sintered into a molybdenum plate blank in a microwave sintering furnace under a vacuum condition; and the sintered molybdenum plate blank is purified using an electron beam melting method, a molybdenum target material is processed by adopting a processing mode of cross rolling after hammer cogging, and the molybdenum target material is machined into a finished molybdenum sputtering target material according to a specified specification after vacuum annealing. The preparation method of the molybdenum plane sputtering target material has the beneficial effects that the prepared molybdenum sputteringtarget material is high i</description><language>chi ; eng</language><subject>CASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FERROUS OR NON-FERROUS ALLOYS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MAKING METALLIC POWDER ; MANUFACTURE OF ARTICLES FROM METALLIC POWDER ; METALLURGY ; PERFORMING OPERATIONS ; POWDER METALLURGY ; PRETREATMENT OF RAW MATERIALS ; PRODUCTION AND REFINING OF METALS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING ; TREATMENT OF ALLOYS OR NON-FERROUS METALS ; WORKING METALLIC POWDER</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200211&DB=EPODOC&CC=CN&NR=110777343A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200211&DB=EPODOC&CC=CN&NR=110777343A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>XIE JINGPEI</creatorcontrib><creatorcontrib>MAO AIXIA</creatorcontrib><creatorcontrib>MA DOUQIN</creatorcontrib><creatorcontrib>CHEN YANFANG</creatorcontrib><creatorcontrib>CHANG QINGHUA</creatorcontrib><creatorcontrib>MAO ZHIPING</creatorcontrib><creatorcontrib>ZHAO HAILI</creatorcontrib><creatorcontrib>YANG BIN</creatorcontrib><creatorcontrib>LIU PEI</creatorcontrib><title>Preparation method of molybdenum plane sputtering target material</title><description>The invention discloses a preparation method of a molybdenum plane sputtering target material, and relates to the technical field of sputtering target material preparation. Molybdenum powder with thepurity of more than or equal to 99% is selected as a raw material, molybdenum powder is pressed into a molybdenum green body through cold isostatic pressing, and then the molybdenum green body is sintered into a molybdenum plate blank in a microwave sintering furnace under a vacuum condition; and the sintered molybdenum plate blank is purified using an electron beam melting method, a molybdenum target material is processed by adopting a processing mode of cross rolling after hammer cogging, and the molybdenum target material is machined into a finished molybdenum sputtering target material according to a specified specification after vacuum annealing. The preparation method of the molybdenum plane sputtering target material has the beneficial effects that the prepared molybdenum sputteringtarget material is high i</description><subject>CASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MAKING METALLIC POWDER</subject><subject>MANUFACTURE OF ARTICLES FROM METALLIC POWDER</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>POWDER METALLURGY</subject><subject>PRETREATMENT OF RAW MATERIALS</subject><subject>PRODUCTION AND REFINING OF METALS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><subject>WORKING METALLIC POWDER</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAMKEotSCxKLMnMz1PITS3JyE9RyE9TyM3PqUxKSc0rzVUoyEnMS1UoLigtKUktysxLVyhJLEpPLVHITQTxE3N4GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hoYG5ubmxibGjMTFqAFcIMlw</recordid><startdate>20200211</startdate><enddate>20200211</enddate><creator>XIE JINGPEI</creator><creator>MAO AIXIA</creator><creator>MA DOUQIN</creator><creator>CHEN YANFANG</creator><creator>CHANG QINGHUA</creator><creator>MAO ZHIPING</creator><creator>ZHAO HAILI</creator><creator>YANG BIN</creator><creator>LIU PEI</creator><scope>EVB</scope></search><sort><creationdate>20200211</creationdate><title>Preparation method of molybdenum plane sputtering target material</title><author>XIE JINGPEI ; MAO AIXIA ; MA DOUQIN ; CHEN YANFANG ; CHANG QINGHUA ; MAO ZHIPING ; ZHAO HAILI ; YANG BIN ; LIU PEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN110777343A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>CASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FERROUS OR NON-FERROUS ALLOYS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MAKING METALLIC POWDER</topic><topic>MANUFACTURE OF ARTICLES FROM METALLIC POWDER</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>POWDER METALLURGY</topic><topic>PRETREATMENT OF RAW MATERIALS</topic><topic>PRODUCTION AND REFINING OF METALS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF ALLOYS OR NON-FERROUS METALS</topic><topic>WORKING METALLIC POWDER</topic><toplevel>online_resources</toplevel><creatorcontrib>XIE JINGPEI</creatorcontrib><creatorcontrib>MAO AIXIA</creatorcontrib><creatorcontrib>MA DOUQIN</creatorcontrib><creatorcontrib>CHEN YANFANG</creatorcontrib><creatorcontrib>CHANG QINGHUA</creatorcontrib><creatorcontrib>MAO ZHIPING</creatorcontrib><creatorcontrib>ZHAO HAILI</creatorcontrib><creatorcontrib>YANG BIN</creatorcontrib><creatorcontrib>LIU PEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>XIE JINGPEI</au><au>MAO AIXIA</au><au>MA DOUQIN</au><au>CHEN YANFANG</au><au>CHANG QINGHUA</au><au>MAO ZHIPING</au><au>ZHAO HAILI</au><au>YANG BIN</au><au>LIU PEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Preparation method of molybdenum plane sputtering target material</title><date>2020-02-11</date><risdate>2020</risdate><abstract>The invention discloses a preparation method of a molybdenum plane sputtering target material, and relates to the technical field of sputtering target material preparation. Molybdenum powder with thepurity of more than or equal to 99% is selected as a raw material, molybdenum powder is pressed into a molybdenum green body through cold isostatic pressing, and then the molybdenum green body is sintered into a molybdenum plate blank in a microwave sintering furnace under a vacuum condition; and the sintered molybdenum plate blank is purified using an electron beam melting method, a molybdenum target material is processed by adopting a processing mode of cross rolling after hammer cogging, and the molybdenum target material is machined into a finished molybdenum sputtering target material according to a specified specification after vacuum annealing. The preparation method of the molybdenum plane sputtering target material has the beneficial effects that the prepared molybdenum sputteringtarget material is high i</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN110777343A |
| source | esp@cenet |
| subjects | CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY PRETREATMENT OF RAW MATERIALS PRODUCTION AND REFINING OF METALS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS WORKING METALLIC POWDER |
| title | Preparation method of molybdenum plane sputtering target material |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T17%3A36%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=XIE%20JINGPEI&rft.date=2020-02-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN110777343A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |