Stage apparatus for semiconductor inspection and lithography systems
Embodiments of the application relate to a stage apparatus for semiconductor inspection and lithography systems. The semiconductor sample is received on a chuck of a stage that is movable with respectto a stage frame. The stage, chuck, and sample are moved under an inspection or exposure head for in...
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| creator | BALAN AVIV |
| description | Embodiments of the application relate to a stage apparatus for semiconductor inspection and lithography systems. The semiconductor sample is received on a chuck of a stage that is movable with respectto a stage frame. The stage, chuck, and sample are moved under an inspection or exposure head for inspecting or exposing the sample, and multiple 2D encoder heads are coupled with the chuck. Multiple2D encoder scales are coupled with a base through which the head is inserted, and a stage encoder is positioned on the stage frame. Movement of the stage, chuck, and sample is controlled based on a positon detected by at least one of the 2D encoder heads until a predefined position that is within a gap that is not covered by the 2D encoder scales is reached. Movement control of the stage, chuck,and sample is switched to being based on a position detected by the stage encoder when such predefined position that is within the gap is reached.
本申请实施例涉及用于半导体检验和光刻系统的载台设备。在可相对于载台框架移动的载台的卡盘上接纳半导体样本。使所述载台、卡盘和样本在用于检验或曝光所述样本的检验或曝 |
| format | Patent |
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本申请实施例涉及用于半导体检验和光刻系统的载台设备。在可相对于载台框架移动的载台的卡盘上接纳半导体样本。使所述载台、卡盘和样本在用于检验或曝光所述样本的检验或曝</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200207&DB=EPODOC&CC=CN&NR=110764369A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200207&DB=EPODOC&CC=CN&NR=110764369A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BALAN AVIV</creatorcontrib><title>Stage apparatus for semiconductor inspection and lithography systems</title><description>Embodiments of the application relate to a stage apparatus for semiconductor inspection and lithography systems. The semiconductor sample is received on a chuck of a stage that is movable with respectto a stage frame. The stage, chuck, and sample are moved under an inspection or exposure head for inspecting or exposing the sample, and multiple 2D encoder heads are coupled with the chuck. Multiple2D encoder scales are coupled with a base through which the head is inserted, and a stage encoder is positioned on the stage frame. Movement of the stage, chuck, and sample is controlled based on a positon detected by at least one of the 2D encoder heads until a predefined position that is within a gap that is not covered by the 2D encoder scales is reached. Movement control of the stage, chuck,and sample is switched to being based on a position detected by the stage encoder when such predefined position that is within the gap is reached.
本申请实施例涉及用于半导体检验和光刻系统的载台设备。在可相对于载台框架移动的载台的卡盘上接纳半导体样本。使所述载台、卡盘和样本在用于检验或曝光所述样本的检验或曝</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAJLklMT1VILChILEosKS1WSMsvUihOzc1Mzs9LKU0uAfIy84oLUpNLMvPzFBLzUhRyMksy8tOLEgsyKhWKK4tLUnOLeRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvLOfoaGBuZmJsZmlozExagAkVjPS</recordid><startdate>20200207</startdate><enddate>20200207</enddate><creator>BALAN AVIV</creator><scope>EVB</scope></search><sort><creationdate>20200207</creationdate><title>Stage apparatus for semiconductor inspection and lithography systems</title><author>BALAN AVIV</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN110764369A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>BALAN AVIV</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BALAN AVIV</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Stage apparatus for semiconductor inspection and lithography systems</title><date>2020-02-07</date><risdate>2020</risdate><abstract>Embodiments of the application relate to a stage apparatus for semiconductor inspection and lithography systems. The semiconductor sample is received on a chuck of a stage that is movable with respectto a stage frame. The stage, chuck, and sample are moved under an inspection or exposure head for inspecting or exposing the sample, and multiple 2D encoder heads are coupled with the chuck. Multiple2D encoder scales are coupled with a base through which the head is inserted, and a stage encoder is positioned on the stage frame. Movement of the stage, chuck, and sample is controlled based on a positon detected by at least one of the 2D encoder heads until a predefined position that is within a gap that is not covered by the 2D encoder scales is reached. Movement control of the stage, chuck,and sample is switched to being based on a position detected by the stage encoder when such predefined position that is within the gap is reached.
本申请实施例涉及用于半导体检验和光刻系统的载台设备。在可相对于载台框架移动的载台的卡盘上接纳半导体样本。使所述载台、卡盘和样本在用于检验或曝光所述样本的检验或曝</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Stage apparatus for semiconductor inspection and lithography systems |
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