ETCHING COMPOSITION FOR SILICONE NITRIDE AND METHOD FOR ETCHING USING SAME

The invention provides an etching composition for silicon nitride and a method of etching using the same. The etching composition includes: a phosphoric acid compound; a substituted or unsubstituted C7 to C8 cyclic hydrocarbon; and water. The etching composition has high selectivity to a silicon nit...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KOH SANG RAN, CHOI JUNG MIN, CHO YOUN JIN, HWANG KI WOOK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
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