LITHOGRAPHY MACHINE AND METHOD

The invention relates to a lithography machine (100B) comprising an optical element (202), an interface (204) coupled to said optical element (202), and a component (208) which is separate from the interface (204) and directly connected, form-fittingly and/or force-fittingly, to the optical element...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	STICKEL FRANZ-JOSEF, DURR DIETMAR, LIEBAUG BJORN, HOFMANN JURGEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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