LITHOGRAPHY MACHINE AND METHOD

The invention relates to a lithography machine (100B) comprising an optical element (202), an interface (204) coupled to said optical element (202), and a component (208) which is separate from the interface (204) and directly connected, form-fittingly and/or force-fittingly, to the optical element...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	STICKEL FRANZ-JOSEF, DURR DIETMAR, LIEBAUG BJORN, HOFMANN JURGEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a lithography machine (100B) comprising an optical element (202), an interface (204) coupled to said optical element (202), and a component (208) which is separate from the interface (204) and directly connected, form-fittingly and/or force-fittingly, to the optical element (202), said optical element (202) comprising an engaging section (210) and the component (208) having a counter engaging section (232) which is configured to engage with said engaging section (210) so as to connect the component (208) form-fittingly and/or force-fittingly to the optical element (202). 本发明涉及一种光刻设备(100B)，其具有光学元件(202)，与所述光学元件(202)耦连的接口(204)，与所述接口(204)分开的构件(208)，所述构件直接地以形状配合和/或力配合方式与所述光学元件(202)连接，其中，所述光学元件(202)具有啮合部段(210)并且所述构件(208)具有对应啮合部段(232)，所述对应啮合部段设置为啮合到所述啮合部段(210)中，以便把所述构件(208)以形状配合和/或力配合方式与所述光学元件(202)连接。