Condensation suppressing method and processing system
Condensation on a member of a processing apparatus can be suppressed. A condensation suppressing method of suppressing condensation in a processing apparatus configured to perform a processing on a processing target object includes a first measurement process, a second measurement process and a firs...
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creator | KAMATA KOJI |
description | Condensation on a member of a processing apparatus can be suppressed. A condensation suppressing method of suppressing condensation in a processing apparatus configured to perform a processing on a processing target object includes a first measurement process, a second measurement process and a first control process. In the first measurement process, a first surface temperature of a member of the processing apparatus, which is exposed within a closed space, is measured. In the first measurement process, a dew-point temperature of air within the closed space is measured. In the first control process, a supply amount of low-dew-point air, which has a dew-point temperature lower than a dew-point temperature of air outside the processing apparatus, into the closed space is controlled based on the first surface temperature and the dew-point temperature of the air within the closed space.
本发明防止处理装置的部件结露。一个实施方式中的防结露方法为处理被处理体的处理装置中的防结露方法,包括第一测量步骤、第二测量步骤和第一控制步骤。在第一测量步骤中,测量露出在封闭空间内的处理装置的部件的第一表面温度。在第一测量步骤中,测量封闭空间内的空气的露点 |
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本发明防止处理装置的部件结露。一个实施方式中的防结露方法为处理被处理体的处理装置中的防结露方法,包括第一测量步骤、第二测量步骤和第一控制步骤。在第一测量步骤中,测量露出在封闭空间内的处理装置的部件的第一表面温度。在第一测量步骤中,测量封闭空间内的空气的露点</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190917&DB=EPODOC&CC=CN&NR=110246742A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190917&DB=EPODOC&CC=CN&NR=110246742A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAMATA KOJI</creatorcontrib><title>Condensation suppressing method and processing system</title><description>Condensation on a member of a processing apparatus can be suppressed. A condensation suppressing method of suppressing condensation in a processing apparatus configured to perform a processing on a processing target object includes a first measurement process, a second measurement process and a first control process. In the first measurement process, a first surface temperature of a member of the processing apparatus, which is exposed within a closed space, is measured. In the first measurement process, a dew-point temperature of air within the closed space is measured. In the first control process, a supply amount of low-dew-point air, which has a dew-point temperature lower than a dew-point temperature of air outside the processing apparatus, into the closed space is controlled based on the first surface temperature and the dew-point temperature of the air within the closed space.
本发明防止处理装置的部件结露。一个实施方式中的防结露方法为处理被处理体的处理装置中的防结露方法,包括第一测量步骤、第二测量步骤和第一控制步骤。在第一测量步骤中,测量露出在封闭空间内的处理装置的部件的第一表面温度。在第一测量步骤中,测量封闭空间内的空气的露点</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB1zs9LSc0rTizJzM9TKC4tKChKLS7OzEtXyE0tychPUUjMS1EoKMpPhooWVxaXpObyMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4Zz9DQwMjEzNzEyNHY2LUAADFcy3w</recordid><startdate>20190917</startdate><enddate>20190917</enddate><creator>KAMATA KOJI</creator><scope>EVB</scope></search><sort><creationdate>20190917</creationdate><title>Condensation suppressing method and processing system</title><author>KAMATA KOJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN110246742A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KAMATA KOJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAMATA KOJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Condensation suppressing method and processing system</title><date>2019-09-17</date><risdate>2019</risdate><abstract>Condensation on a member of a processing apparatus can be suppressed. A condensation suppressing method of suppressing condensation in a processing apparatus configured to perform a processing on a processing target object includes a first measurement process, a second measurement process and a first control process. In the first measurement process, a first surface temperature of a member of the processing apparatus, which is exposed within a closed space, is measured. In the first measurement process, a dew-point temperature of air within the closed space is measured. In the first control process, a supply amount of low-dew-point air, which has a dew-point temperature lower than a dew-point temperature of air outside the processing apparatus, into the closed space is controlled based on the first surface temperature and the dew-point temperature of the air within the closed space.
本发明防止处理装置的部件结露。一个实施方式中的防结露方法为处理被处理体的处理装置中的防结露方法,包括第一测量步骤、第二测量步骤和第一控制步骤。在第一测量步骤中,测量露出在封闭空间内的处理装置的部件的第一表面温度。在第一测量步骤中,测量封闭空间内的空气的露点</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | Condensation suppressing method and processing system |
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