Fully automatic exposure machine

The invention relates to a fully automatic exposure machine comprising a frame provided with an upper frame module, a CCD device and a light source device in cooperation, wherein the upper frame module can be lifted and lowered; a lower frame module is disposed under the upper frame module; the lowe...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GUO JIABAO, QIU TIANSHENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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