Fully automatic exposure machine

Fully automatic exposure machine

The invention relates to a fully automatic exposure machine comprising a frame provided with an upper frame module, a CCD device and a light source device in cooperation, wherein the upper frame module can be lifted and lowered; a lower frame module is disposed under the upper frame module; the lowe...

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Hauptverfasser: GUO JIABAO, QIU TIANSHENG
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator GUO JIABAO
QIU TIANSHENG
description The invention relates to a fully automatic exposure machine comprising a frame provided with an upper frame module, a CCD device and a light source device in cooperation, wherein the upper frame module can be lifted and lowered; a lower frame module is disposed under the upper frame module; the lower frame module is provided with a lower frame moving device movable in the front-rear direction; theframe is further provided with a discharging device matching the lower frame module; the left and right ends of the discharging device matches a feeding conveying device and a discharging conveying device respectively; the discharging device comprises a discharging mounting frame arranged on the frame; the discharging mounting frame is provided with two central clamping blocks capable of synchronously moving close to or away from each other; the moving direction of the central clamping blocks is perpendicular to the conveying direction of the discharging conveying device; the inner sides of the two central clamping b
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the lower frame module is provided with a lower frame moving device movable in the front-rear direction; theframe is further provided with a discharging device matching the lower frame module; the left and right ends of the discharging device matches a feeding conveying device and a discharging conveying device respectively; the discharging device comprises a discharging mounting frame arranged on the frame; the discharging mounting frame is provided with two central clamping blocks capable of synchronously moving close to or away from each other; the moving direction of the central clamping blocks is perpendicular to the conveying direction of the discharging conveying device; the inner sides of the two central clamping b</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; 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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Fully automatic exposure machine
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